Global Rapid Thermal Annealing (RTA) Equipment Market Research Report 2023-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2029

Global Rapid Thermal Annealing (RTA) Equipment Market Research Report 2023-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2029

Rapid Thermal Annealing (RTA) Equipment is a type of semiconductor manufacturing equipment. Rapid Thermal Annealing (RTA) Equipment is capable of heating workpieces to higher temperatures, using different holding times depending on material and workpiece size, followed by rapid cooling.

Market Overview:

The latest research study on the global Rapid Thermal Annealing (RTA) Equipment market finds that the global Rapid Thermal Annealing (RTA) Equipment market reached a value of USD 1102.75 million in 2022. It’s expected that the market will achieve USD 1451.1 million by 2028, exhibiting a CAGR of 4.68% during the forecast period.

The size of the semiconductor market continues to expand

Semiconductor equipment plays an important role in chip manufacturing. Semiconductor equipment is the cornerstone of semiconductor manufacturing and the foundation and core of the semiconductor industry. From the perspective of the entire semiconductor industry, with the vigorous development of automobiles, electronic products and other fields, the market demand for chips, sensors, optoelectronic devices, etc. continues to grow. Therefore, as the size of the semiconductor market continues to expand, so does the market demand for semiconductor equipment. Rapid Thermal Annealing (RTA) Equipment is one of the semiconductor equipment and plays an important role in the front-end processing of semiconductors. Overall, as the semiconductor market continues to expand, the demand for Rapid Thermal Annealing (RTA) Equipment will continue to increase. This will be an important driving force for the development of the industry.
The risk of technology upgrade iteration
Rapid Thermal Annealing (RTA) Equipment industry companies belong to the semiconductor equipment manufacturing industry, which is a technology-intensive industry. The research and development of Rapid Thermal Annealing (RTA) Equipment involves many disciplines such as microelectronics, electrical, mechanical, material, chemical engineering, fluid mechanics, automation, communication, software systems, etc., and has a high technical research and development threshold. With the rapid development of artificial intelligence, Internet of Things, big data and other application fields, the performance of semiconductor products needs to be constantly updated and iterated. Therefore, the requirements of the market for semiconductor equipment are also constantly increasing.
Reduce pattern effect
In Rapid Thermal Annealing (RTA) Equipment systems, the heat source is directly facing the wafer surface, rather than heating the wafer edge as in a batch furnace. As a result, Rapid Thermal Annealing (RTA) Equipment systems handle large diameter wafers without compromising process uniformity and ramp-up (down) rates. However, the device distribution pattern on the wafer surface will impose some influences and limitations on temperature. Therefore, the Rapid Thermal Annealing (RTA) Equipment system uses a radiant heat source to heat the wafer, and the temperature is affected by the optical properties. As the device size continues to shrink and the requirements for process uniformity become more stringent, how to optimize the heating structure and reduce the pattern effect has become an important research field. The current solutions to the pattern effect include a double-sided heating method that reduces the incident energy on the wafer surface, and a method that uses a heat source close to the wafer temperature to irradiate the patterned side. With the continuous development of the industry, it is a trend of industry development to strengthen the temperature control capability of Rapid Thermal Annealing (RTA) Equipment and reduce the pattern effect.

Region Overview:

In 2022, the share of the Rapid Thermal Annealing (RTA) Equipment market in Asia Pacific stood at 82.08%.

Company Overview:

Applied Materials is one of the major players operating in the Rapid Thermal Annealing (RTA) Equipment market, holding a share of 65.24% in 2023.

Applied Materials is a leader in materials engineering solutions used to produce nearly all of the world's new chips and advanced displays. Applied Materials' expertise in modifying materials at the atomic level and on an industrial scale enables customers to turn the possibilities into reality.

Mattson Technology, Inc. designs, manufactures, sells, and supports worldwide semiconductor wafer processing equipment for integrated circuit manufacturing. The company is a major supplier of plasma and rapid thermal processing equipment to the global semiconductor industry. The company's processing facilities utilize innovative technologies to provide advanced processing capabilities and high productivity for the manufacture of current and next-generation integrated circuits. Mattson Technology's new innovation in Atomic Surface Engineering TM addresses the most critical 3D logic and memory manufacturing challenges.

Segmentation Overview:

By type, Laser-based segment accounted for the largest share of market in 2022.

Lamp-based

Differentiate according to different heating sources. Lamp-based refers to the use of lamps as a heating source to irradiate the surface of the material.
Laser-based
Laser-based refers to the use of a high-energy-density laser beam as a heating source to irradiate the surface of an annealed material.
Heater-based
Heater-based refers to the use of a heater as a heating source to irradiate the surface of the annealed material. Induction heaters include an electromagnet through which high-frequency alternating current is passed.

Application Overview:

The market's largest segment by application is the segment Industrial Production, with a market share of 97.66% in 2022.

R&D

Differentiate according to different downstream customers. Refers to the purchase of products by research institutions for semiconductor manufacturing process research.
Industrial Production
Refers to a semiconductor manufacturing plant that purchases products for use in product production.

Key Companies in the global Rapid Thermal Annealing (RTA) Equipment market covered in Chapter 3:

CVD Equipment Corporation
Veeco
Mattson Technology
Screen Holdings
AnnealSys
Applied Materials
Kokusai Electric
JTEKT Thermo Systems
Others
Tokyo Electron
Centrotherm

In Chapter 4 and Chapter 14.2, on the basis of types, the Rapid Thermal Annealing (RTA) Equipment market from 2018 to 2029 is primarily split into:

Lamp-based
Laser-based
Heater-based

In Chapter 5 and Chapter 14.3, on the basis of Downstream Industry, the Rapid Thermal Annealing (RTA) Equipment market from 2018 to 2029 covers:

R&D
Industrial Production

Geographically, the detailed analysis of consumption, revenue, market share and growth rate, historic and forecast (2018-2029) of the following regions are covered in Chapter 8 to Chapter 14:

North America (United States, Canada)
Europe (Germany, UK, France, Italy, Spain, Russia, Netherlands, Turkey, Switzerland, Sweden)
Asia Pacific (China, Japan, South Korea, Australia, India, Indonesia, Philippines, Malaysia)
Latin America (Brazil, Mexico, Argentina)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa)