Global Post CMP Cleaning Solutions Market Research Report 2023-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2029

Global Post CMP Cleaning Solutions Market Research Report 2023-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2029

Chemical mechanical planarization (CMP) is a critical enabling technology in advanced integrated circuit manufacturing. Defects and residues either deposited or formed during the planarization process that can adversely affect product yield are subsequently removed in the post-CMP cleaning step. Aqueous formulations employed for post-CMP (PCMP) cleaning is designed to protect the planarized metals and dielectrics preventing metal corrosion while providing a smooth defect-free wafer surface.

Market Overview:

The latest research study on the global Post CMP Cleaning Solutions market finds that the global Post CMP Cleaning Solutions market reached a value of USD 203.55 million in 2022. It’s expected that the market will achieve USD 249.12 million by 2028, exhibiting a CAGR of 3.42% during the forecast period.

Market Top Trends

Post CMP Cleaning Solutions is widely used in electronics manufacturing plants in North America, Japan and other regions with a large market. Downstream demand is the most important driving factor in the Post CMP Cleaning Solutions industry. With the improvement of the quality of raw materials, the growth rate of demand for Post CMP Cleaning Solutions products from electronics factories has slowed down, resulting in a slowdown in the growth rate of the Post CMP Cleaning Solutions industry. This requires companies to look for new markets and continuously improve product quality in order to seek new growth opportunities.

Market Drivers

Post CMP Cleaning Solutions has excellent particle removal capabilities. In addition to protecting planarized metals and dielectrics, preventing metal corrosion, it also provides a smooth and defect-free wafer surface. In addition, the product has a high cleaning efficiency, which can meet the lower cost goal of all equipment cleaning modules.

There are two main types of common toxicity of metal impurities: neurotoxicity and nephrotoxicity. For example: long-term exposure to lead can cause mental retardation in children. Mercury can cause deafness and mental disorders. Japan's Mizugure disease is caused by methylmercury, and this effect may continue in future generations. Lead, cadmium, and mercury are all nephrotoxic. In the case of long-term exposure, the combined use of arsenic and cadmium may even cause superimposition of nephrotoxicity.

Market Challenges

With the continuous improvement of the economic development speed, the awareness of global environmental protection is also increasing. Strict environmental policies have put forward higher requirements for the Post CMP Cleaning Solutions industry. First of all, Tetramethylammonium hydroxide is banned in more and more regions, which will put forward higher requirements for product development and innovation. Secondly, environmental protection policies and customer EHS requirements differ between different regions and different countries, which poses challenges to large multinational companies in the industry.

The COVID-19 epidemic has postponed or canceled the technology exhibition, shut down operations in the electronics, industrial and automotive fields, and also harmed the supply chain of CMP slurry raw materials. These factors will damage the prospects of the CMP slurry market in the short term. And most of the factories have not yet been fully operational, which also limits the overall supply of the CMP Slurry market, thereby reducing the industry's ability to deal with the backlog and quickly recover from losses. The stagnation caused by COVID-19 in the upstream industry will hinder the short-term development of Post CMP Cleaning Solutions.

Region Overview:

China was the largest revenue market with a market share of 32.33% in 2015 and 33.96% in 2019, an increase of 1.63%. In 2019, the North America market share was 19.04%, ranking second.

Company Overview:

The top three companies are Entegris, Versum Materials (Merck KGaA), Mitsubishi Chemical Corporation with the revenue market share of 25.12%, 21.32% and 15.42% in 2019.

Segmentation Overview:

Among different product types, Acidic Material segment is anticipated to contribute the largest market share in 2027.

Application Overview:

By application, the Metal Impurities segment occupied the biggest share from 2017 to 2022.

Key Companies in the global Post CMP Cleaning Solutions market covered in Chapter 3:

Mitsubishi Chemical Corporation
Fujifilm
Kanto Chemical Company, Inc.
Versum Materials (Merck KGaA)
DuPont
Technic
Solexir
BASF SE
Entegris
JT Baker (Avantor)

In Chapter 4 and Chapter 14.2, on the basis of types, the Post CMP Cleaning Solutions market from 2018 to 2029 is primarily split into:

Acidic Material
Alkaline Material,

In Chapter 5 and Chapter 14.3, on the basis of Downstream Industry, the Post CMP Cleaning Solutions market from 2018 to 2029 covers:

Metal Impurities
Organic Residue

Geographically, the detailed analysis of consumption, revenue, market share and growth rate, historic and forecast (2018-2029) of the following regions are covered in Chapter 8 to Chapter 14:

North America (United States, Canada)
Europe (Germany, UK, France, Italy, Spain, Russia, Netherlands, Turkey, Switzerland, Sweden)
Asia Pacific (China, Japan, South Korea, Australia, India, Indonesia, Philippines, Malaysia)
Latin America (Brazil, Mexico, Argentina)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa)