Global Photoresists and Ancillaries Market Research Report 2022 - Market Size, Current Insights and Development Trends
Photoresist is an organic polymer that changes its chemical structure when exposed to ultraviolet light. There are two types of photoresists, positive and negative. When exposed to UV light, the positive photoresist becomes soluble, while when exposed to UV light, the negative photoresist becomes crosslinked and insoluble. Photoresist aids are related products used with photoresists.
The report focuses on the Photoresists and Ancillaries market size, segment size (mainly covering product type, application, and geography), competitor landscape, recent status, and development trends. Furthermore, the report provides strategies for companies to overcome threats posed by COVID-19.
Technological innovation and advancement will further optimize the performance of the product, enabling it to acquire a wider range of applications in the downstream market. Moreover, customer preference analysis, market dynamics (drivers, restraints, opportunities), new product release, impact of COVID-19, regional conflicts and carbon neutrality provide crucial information for us to take a deep dive into the Photoresists and Ancillaries market.
Major Players in the Photoresists and Ancillaries market are:
Dow Chemical
DuPont
Tokyo Ohka Kogyo
JSR Corporation
Sumitomo Chemical
LG Chem
Avantor Performance Materials
Merck KGaA
Shin-Etsu Chemical
FUJIFILM
On the basis of types, the Photoresists and Ancillaries market is primarily split into:
G-line and I-line
KrF
ArF Dry
ArF Immersion
On the basis of applications, the market covers:
Semiconductors and Integrated Circuits (ICs)
Printed Circuit Boards (PCB)
Major Regions or countries covered in this report:
United States
Europe
China
Japan
India
Southeast Asia
Latin America
Middle East and Africa
Others
Years considered for this report:
Historical Years: 2017-2021
Base Year: 2021
Estimated Year: 2022
Forecast Period: 2022-2029
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