Global Photomask Defect Detection Equipment Market Research Report 2024-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2030

Global Photomask Defect Detection Equipment Market Research Report 2024-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2030


EUV mask defect inspection equipment is a device used to detect defects or pattern placement errors on mask plates (also called masks or masks) used in extreme ultraviolet (EUV) lithography technology. These defects or errors can affect the quality and accuracy of circuit patterns on semiconductor wafers, reducing chip performance and yield. The market demand for EUV mask defect inspection equipment is growing with the continuous advancement of semiconductor manufacturing processes, especially at advanced nodes such as 7nm, 5nm and 3nm.

Market Overview:

The latest research study on the global Photomask Defect Detection Equipment market finds that the global Photomask Defect Detection Equipment market reached a value of USD 838.99 million in 2023. It’s expected that the market will achieve USD 1512.49 million by 2029, exhibiting a CAGR of 10.32% during the forecast period.

Limiting factor

High technical difficulty

Mask defect inspection equipment is a high-end semiconductor inspection equipment that needs to have the characteristics of high resolution, high speed, high stability, etc., and must be adaptable to different photolithography technologies and mask materials. Currently, the only companies in the world that can provide EUV mask defect detection equipment are Lasertec, KLA, etc. Lasertec, in particular, has a number of patents and core technologies and is the technology leader in the industry. If companies from other countries and regions want to enter this field, they need to carry out a lot of technological research and development and innovation, invest huge amounts of money and human resources, and face greater technical risks and market uncertainty.

Region Overview:

In 2022, the share of the Photomask Defect Detection Equipment market in Taiwan, China stood at 46%.

Company Overview:

Lasertec specializes in applied optics-based inspection and measurement solutions for the semiconductor, FPD and other industries. Lasertec's inspection and measurement systems play a vital role in the semiconductor manufacturing process, as the miniaturization of IC designs continues to advance with the volume production of EUV lithography and the adoption of new materials and structures. In the field of photomask-related inspection systems, Lasertec's EUV mask blank inspection system has become a de facto standard tool, and Lasertec's mask inspection system occupies a large market share in leading lithography machines. In the field of wafer-related inspection and measurement systems, Lasertec provides various solutions, including wafer edge inspection, full-wafer film thickness inspection, silicon thickness measurement, SiC wafer inspection, etc., to meet customer needs.

Lasertec is one of the major players operating in the Photomask Defect Detection Equipment market, holding a share of 100% in 2023.

Segmentation Overview:

As for product types, the Patterned mask inspection segment held the largest market share in 2022.

Application Overview:

The market's largest segment by application is the segment chip maker, with a market share of 86.24% in 2022.

Key Companies in the global Photomask Defect Detection Equipment market covered in Chapter 3:

Lasertec

In Chapter 4 and Chapter 14.2, on the basis of types, the Photomask Defect Detection Equipment market from 2019 to 2030 is primarily split into:

Blank mask inspection
Patterned mask inspection

In Chapter 5 and Chapter 14.3, on the basis of Downstream Industry, the Photomask Defect Detection Equipment market from 2019 to 2030 covers:

chip maker
Mask manufacturer

Geographically, the detailed analysis of consumption, revenue, market share and growth rate, historic and forecast (2019-2030) of the following regions are covered in Chapter 8 to Chapter 14:

North America (United States, Canada)
Europe (Germany, UK, France, Italy, Spain, Russia, Netherlands, Turkey, Switzerland, Sweden)
Asia Pacific (China, Japan, South Korea, Australia, India, Indonesia, Philippines, Malaysia)
Latin America (Brazil, Mexico, Argentina)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa)


Chapter 1 Market Definition and Statistical Scope
Chapter 2 Research Findings and Conclusion
Chapter 3 Key Companies’ Profile
Chapter 4 Global Photomask Defect Detection Equipment Market Segmented by Type
Chapter 5 Global Photomask Defect Detection Equipment Market Segmented by Downstream Industry
Chapter 6 Photomask Defect Detection Equipment Industry Chain Analysis
Chapter 7 The Development and Dynamics of Photomask Defect Detection Equipment Market
Chapter 8 Global Photomask Defect Detection Equipment Market Segmented by Geography
Chapter 9 North America
Chapter 10 Europe
Chapter 11 Asia Pacific
Chapter 12 Latin America
Chapter 13 Middle East & Africa
Chapter 14 Global Photomask Defect Detection Equipment Market Forecast by Geography, Type, and Downstream Industry 2024-2030
Chapter 15 Appendix

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