Global Photolithography Equipment Market Research Report 2023-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2029

Global Photolithography Equipment Market Research Report 2023-Competitive Analysis, Status and Outlook by Type, Downstream Industry, and Geography, Forecast to 2029

A photolithography system is essentially a projection system, and light is projected through a blueprint of the pattern that will be printed. Photolithography equipment refers to the process of transferring geometric patterns to a film and substrate in microfabrication. It relies on a single beam of ultraviolet light to etch a pattern into integrated circuits. As it assists in producing extremely small incisions while being highly efficient and cost-effective, it is widely used to produce semiconductor products and control the exact size and shape of a substrate. Photolithography equipment can be classified according to the type of light used, such as ultraviolet, extreme ultraviolet, and so on.

Market Overview:

The latest research study on the global Photolithography Equipment market finds that the global Photolithography Equipment market reached a value of USD 21723.89 million in 2022. It’s expected that the market will achieve USD 46578.64 million by 2028, exhibiting a CAGR of 13.56% during the forecast period.

The epidemic has also affected the lithography equipment industry, with rising raw material prices, supply chain disruptions, and downstream industry production and operations being affected. In the long run, with the weakening of the impact of the epidemic, the recovery of production and life, the advancement of technology, and the continuous development of downstream industries, the market has broad prospects.

Drivers

Product features and advantages drive industry development.
Benefiting from the strong downstream demand, photolithography equipment is expected to increase in volume and price to drive the continuous growth of the market space. In terms of price: With the continuous upgrading of the chip manufacturing process, the manufacturing of IC front-end photolithography equipment has become increasingly complex, and its price has continued to rise. The development of advanced processes has reduced the cost of transistors, but the high-end photolithography equipment has continued to increase. Quantity: The larger wafer size and the shrinking process will increase the number of equipment required for the production line and increase the performance requirements.

Demand for semiconductors in emerging technology applications of 5G, AI and IoT will bring growth potential for photolithography equipment.

The development of the new energy vehicle industry drives the growth of the photolithography equipment market.

Restraints and Challenges

High industry barriers, high R&D costs and continuous demand for technological innovation.
Photolithography equipment is indispensable precision equipment in the entire chip industry manufacturing. Because photolithography equipment has extremely high requirements on optical technology and supply chain, and has extremely high technical barriers, it has become a highly monopolized industry. The key components of ultra-high-end lithography machines come from different developed countries, such as American light sources, German lenses and French valve parts. New entrants in emerging markets usually can only provide low-end photolithography equipment. Because photolithography equipment has extremely high requirements on intellectual property and supply chain, it is difficult for new entrants to reach the international leading level in the short term.
Raw material prices fluctuate.

Opportunities

Photolithography equipment is the core of the lithography process, and it is also the equipment with the highest technical content among all semiconductor manufacturing equipment. With the advancement of photolithography equipment technology, the process level of lithography continues to improve the process and performance level of chips, and promote the development of the industry.

Region Overview:

In 2021, the share of the Photolithography Equipment market in China stood at 53.73%.

Company Overview:

ASML Holding
ASML Holding N.V. (commonly shortened to ASML and originally standing for Advanced Semiconductor Materials Lithography) is a Dutch multinational corporation, founded in 1984 as a joint venture between the Dutch companies Advanced Semiconductor Materials International (ASMI) and Philips.
ASML is an innovation leader in the semiconductor industry. They provide chipmakers with everything they need hardware, software and services to mass-produce patterns on silicon through lithography.

Nikon

Nikon Corporation, also known just as Nikon, is a Japanese multinational corporation headquartered in Tokyo, Japan, specializing in optics and imaging products. The companies held by Nikon form the Nikon Group.

ASML Holding is one of the major players operating in the Photolithography Equipment market, holding a share of 78.39% in 2022.

ASML Holding, Nikon, Canon, JEOL, Nuflare Technology are the five key players in the global Photolithography Equipment market. These companies have shown consistent growth in revenue, larger volumes of sales and a prominent presence in terms of share in the global market in the past 5 years.

Segmentation Overview:

I-line
i-line lithography uses ultraviolet light with an exposure wavelength of 365 nanometers. In this optics, a high-pressure mercury vapor lamp is used. This offers superior performance and costs advantage to the manufacturer. i-line lithography equipment are utilized in industries such as semiconductor manufacturing, and automotive.

Krypton Fluoride (KrF)

A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser. Krypton Fluoride photolithography equipment is commonly used in the production of semiconductor integrated circuits, industrial micromachining, and scientific research.

Argon Fluoride Dry (ArF Dry)

The argon fluoride laser (ArF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. ArF dry lithography light sources are being used to consistently pattern a significant number of mid-critical layers on wafers, while providing extended module lifetimes and greater critical dimension (CD) control.

Argon Fluoride Immersion (ArFi)

ArF immersion light sources feature a 193 nm wavelength for patterning critical layers during IC production and for multi-patterning applications that support the world's advanced semiconductor production nodes.

Extreme Ultraviolet (EUV)

Extreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in steppers, machines that make integrated circuits (ICs) for computers and other electronic devices. It uses a range of extreme ultraviolet (EUV) wavelengths, roughly spanning a 2% FWHM bandwidth of about 13.5 nm, to produce a pattern by exposing reflective photomask to UV light which gets reflected onto a substrate covered by photoresist. It is widely applied in semiconductor device fabrication process.

By type, Extreme Ultraviolet (EUV) segment accounted for the largest share of market in 2021.

Application Overview:

Integrated circuit (IC)
Lithography equipment is mainly used for front-end manufacturing and back-end packaging of integrated circuits (chips).

Flat Panel Display (FPD)

A flat-panel display is an electronic display used to display visual content such as text or images. It is present in consumer, medical, transportation, and industrial equipment. Photolithography equipment is also used to manufacture flat-panel displays.

By application, the Integrated circuit (IC) segment occupied the biggest share from 2017 to 2022.

Key Companies in the global Photolithography Equipment market covered in Chapter 3:

EV Group
ASML Holding
Rudolph Technologies
Nikon
Canon
Nuflare Technology
JEOL

In Chapter 4 and Chapter 14.2, on the basis of types, the Photolithography Equipment market from 2018 to 2029 is primarily split into:

I-line
Krypton Fluoride (KrF)
Argon Fluoride Dry (ArF Dry)
Argon Fluoride Immersion (ArFi)
Extreme Ultraviolet (EUV)
Others

In Chapter 5 and Chapter 14.3, on the basis of Downstream Industry, the Photolithography Equipment market from 2018 to 2029 covers:

Integrated circuit (IC)
Flat Panel Display (FPD)
Others

Geographically, the detailed analysis of consumption, revenue, market share and growth rate, historic and forecast (2018-2029) of the following regions are covered in Chapter 8 to Chapter 14:

North America (United States, Canada)
Europe (Germany, UK, France, Italy, Spain, Russia, Netherlands, Turkey, Switzerland, Sweden)
Asia Pacific (China, Japan, South Korea, Australia, India, Indonesia, Philippines, Malaysia)
Latin America (Brazil, Mexico, Argentina)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa)