Global Sputter Targets Market Growth (Status and Outlook) 2025-2031

The global Sputter Targets market size is predicted to grow from US$ 4323 million in 2025 to US$ 4751 million in 2031; it is expected to grow at a CAGR of 1.6% from 2025 to 2031.

Sputtering is a technology used to form a thin film on a silicon wafer, glass, or other substrate. Within a vacuum state maintained in a sputtering machine, a sputtering target is bombarded with argon ions. This causes atoms or molecules to be emitted from the sputtering target. The atoms or molecules are deposited and form a thin film on the substrate. A sputtering target is the object of the ion bombardment when sputtering takes place.

Global core sputter targets manufacturers include Materion (Heraeus), JX Nippon Mining & Metals Corporation etc. The top 5 companies hold a share about 44%. Asia Pacific is the largest market, with a share about 83%, followed by Americas and Europe with the share about 10% and 5%.In terms of product, metal targets is the largest segment, with a share about 60%. And in terms of application, the largest application is semiconductor, followed by flat panel display.

LPI (LP Information)' newest research report, the “Sputter Targets Industry Forecast” looks at past sales and reviews total world Sputter Targets sales in 2024, providing a comprehensive analysis by region and market sector of projected Sputter Targets sales for 2025 through 2031. With Sputter Targets sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Sputter Targets industry.

This Insight Report provides a comprehensive analysis of the global Sputter Targets landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyses the strategies of leading global companies with a focus on Sputter Targets portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Sputter Targets market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Sputter Targets and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Sputter Targets.

This report presents a comprehensive overview, market shares, and growth opportunities of Sputter Targets market by product type, application, key players and key regions and countries.

Segmentation by Type:
Metal Target
Alloy Target
Ceramic Compound Target

Segmentation by Application:
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analyzing the company's coverage, product portfolio, its market penetration.
Materion (Heraeus)
Linde
JX Nippon Mining & Metals Corporation
Mitsui Mining & Smelting
Plansee SE
Hitachi Metals
Honeywell
Sumitomo Chemical
Konfoong Materials International Co., Ltd
TOSOH
ULVAC
Luvata
GRIKIN Advanced Material Co., Ltd.
LT Metal
TANAKA
Longhua Technology Group (Luoyang) Co., Ltd.
Fujian Acetron New Materials Co., Ltd
FURAYA Metals Co., Ltd
Umicore Thin Film Products
Advantec
Changzhou Sujing Electronic Material
Angstrom Sciences

Please note: The report will take approximately 2 business days to prepare and deliver.