Global Semiconductor Used High Purity Sputtering Target Material Market Growth 2023-2029

Global Semiconductor Used High Purity Sputtering Target Material Market Growth 2023-2029

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. In this report, we counted the semiconductor use high purity sputtering target material with 4N (purity≥99.99%).

LPI (LP Information)' newest research report, the “Semiconductor Used High Purity Sputtering Target Material Industry Forecast” looks at past sales and reviews total world Semiconductor Used High Purity Sputtering Target Material sales in 2022, providing a comprehensive analysis by region and market sector of projected Semiconductor Used High Purity Sputtering Target Material sales for 2023 through 2029. With Semiconductor Used High Purity Sputtering Target Material sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Semiconductor Used High Purity Sputtering Target Material industry.

This Insight Report provides a comprehensive analysis of the global Semiconductor Used High Purity Sputtering Target Material landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Semiconductor Used High Purity Sputtering Target Material portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms' unique position in an accelerating global Semiconductor Used High Purity Sputtering Target Material market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Semiconductor Used High Purity Sputtering Target Material and breaks down the forecast by type, by application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Semiconductor Used High Purity Sputtering Target Material.

The global Semiconductor Used High Purity Sputtering Target Material market size is projected to grow from US$ 1724.7 million in 2022 to US$ 2077.8 million in 2029; it is expected to grow at a CAGR of 2077.8 from 2023 to 2029.

Global key players of semiconductor used high purity sputtering target material include JX Nippon Mining & Metals Corporation, Materion, Konfoong Materials International, Linde, Plansee SE, etc. Global top five manufacturers hold a share over 58%. The key players are mainly located in Europe, North America, China, and Japan. In terms of product, metal sputtering target material is the largest segment, with a share over 62%. And in terms of application, the largest application is consumer electronics, with a share over 39%, followed by vehicle electronics.

This report presents a comprehensive overview, market shares, and growth opportunities of Semiconductor Used High Purity Sputtering Target Material market by product type, application, key manufacturers and key regions and countries.

Market Segmentation:

Segmentation by type
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material

Segmentation by application
Consumer Electronics
Vehicle Electronics
Communication Electronics
Others

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analyzing the company's coverage, product portfolio, its market penetration.
JX Nippon Mining & Metals Corporation
Materion
Konfoong Materials International Co., Ltd.
Linde
Plansee SE
Honeywell
TOSOH
TANAKA
ULVAC
Luvata
Hitachi Metals
Sumitomo Chemical
Longhua Technology Group (Luoyang) Co., Ltd.
GRIKIN Advanced Material Co., Ltd.
Umicore
Angstrom Sciences
Advantec
Changzhou Sujing Electronic Material
FURAYA Metals Co., Ltd

Key Questions Addressed in this Report

What is the 10-year outlook for the global Semiconductor Used High Purity Sputtering Target Material market?

What factors are driving Semiconductor Used High Purity Sputtering Target Material market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do Semiconductor Used High Purity Sputtering Target Material market opportunities vary by end market size?

How does Semiconductor Used High Purity Sputtering Target Material break out type, application?

What are the influences of COVID-19 and Russia-Ukraine war?

Please note: The report will take approximately 2 business days to prepare and deliver.


*This is a tentative TOC and the final deliverable is subject to change.*
1 Scope of the Report
2 Executive Summary
3 Global Semiconductor Used High Purity Sputtering Target Material by Company
4 World Historic Review for Semiconductor Used High Purity Sputtering Target Material by Geographic Region
5 Americas
6 APAC
7 Europe
8 Middle East & Africa
9 Market Drivers, Challenges and Trends
10 Manufacturing Cost Structure Analysis
11 Marketing, Distributors and Customer
12 World Forecast Review for Semiconductor Used High Purity Sputtering Target Material by Geographic Region
13 Key Players Analysis
14 Research Findings and Conclusion

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