The global Semiconductor CMP Polishing Slurry market size is predicted to grow from US$ 2251 million in 2025 to US$ 3799 million in 2031; it is expected to grow at a CAGR of 9.1% from 2025 to 2031.
CMP slurries are employed to polish and planarize complex layers of integrated circuits to customer specific requirements. CMP slurries are liquid solutions generally composed of high-purity deionized water and a proprietary mix of chemical additives and engineered abrasives that chemically and mechanically interact at an atomic level with the surface material of the IC device.
The semiconductor CMP Polishing slurries are mainly used in wafer production, IC manufacturing and advanced packaging. key end users include wafer foundries and IDMs. Typical foundries players are TSMC, SMIC, UMC and SMIC, etc. Typical IDMs are Intel, Samsung Electronics, SK Hynix, Infineon, STMicroelectronics, Texas Instruments, Micron Technology, NXP, ADI (Analog Devices, Inc), Renesas Electronics Corporation, Microchip Technology, and Onsemi, etc.
The global market for semiconductor was estimated at US$ 526.8 billion in the year 2023, is projected to US$ 780.7 billion by 2030. IC Manufacturing is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM).
According to our research, the global semiconductor manufacturing (wafer fabrication) market is projected to grow from US$ 251.7 billion in 2023 to US$ 506.5 billion by 2030, at a Compound Annual Growth Rate (CAGR) of 40.49% during the forecast period. This will drive rapid growth of global Cu CMP slurry.
LP Information, Inc. (LPI) ' newest research report, the “Semiconductor CMP Polishing Slurry Industry Forecast” looks at past sales and reviews total world Semiconductor CMP Polishing Slurry sales in 2024, providing a comprehensive analysis by region and market sector of projected Semiconductor CMP Polishing Slurry sales for 2025 through 2031. With Semiconductor CMP Polishing Slurry sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Semiconductor CMP Polishing Slurry industry.
This Insight Report provides a comprehensive analysis of the global Semiconductor CMP Polishing Slurry landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Semiconductor CMP Polishing Slurry portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Semiconductor CMP Polishing Slurry market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Semiconductor CMP Polishing Slurry and breaks down the forecast by Abrasive Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Semiconductor CMP Polishing Slurry.
This report presents a comprehensive overview, market shares, and growth opportunities of Semiconductor CMP Polishing Slurry market by product type, application, key manufacturers and key regions and countries.
Segmentation by Abrasive Type:
Silica Polishing Slurry
Alumina Polishing Slurry
Cerium Oxide Polishing Slurry
Segmentation by Application:
Semiconductor Wafer
IC Manufacturing
Advanced Packaging
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Fujifilm
Resonac
Fujimi Incorporated
DuPont
Merck KGaA
Anjimirco Shanghai
AGC
KC Tech
JSR Corporation
Soulbrain
TOPPAN INFOMEDIA
Samsung SDI
Hubei Dinglong
Saint-Gobain
Ace Nanochem
Dongjin Semichem
Vibrantz (Ferro)
WEC Group
SKC (SK Enpulse)
Shanghai Xinanna Electronic Technology
Zhuhai Cornerstone Technologies
Shenzhen Angshite Technology
Zhejiang Bolai Narun Electronic Materials
Key Questions Addressed in this Report
What is the 10-year outlook for the global Semiconductor CMP Polishing Slurry market?
What factors are driving Semiconductor CMP Polishing Slurry market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do Semiconductor CMP Polishing Slurry market opportunities vary by end market size?
How does Semiconductor CMP Polishing Slurry break out by Abrasive Type, by Application?
Please note: The report will take approximately 2 business days to prepare and deliver.
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