Global Photosensitive Materials for Photoresists Market Growth 2024-2030

Global Photosensitive Materials for Photoresists Market Growth 2024-2030

Photoresist (PR) is a chemical that changes properties when exposed to certain wavelengths of light to form desired patterns of coating on substrate surfaces. PR serves as key material for the photolithography of semiconductor circuits in the manufacturing process.

This report studies the Photosensitive Materials for Photoresists, include Photo Acid Generator (PAG) and Photo Acid Compound (PAC).

The global Photosensitive Materials for Photoresists market size is projected to grow from US$ 153 million in 2024 to US$ 216 million in 2030; it is expected to grow at a CAGR of 5.9% from 2024 to 2030.

LP Information, Inc. (LPI) ' newest research report, the “Photosensitive Materials for Photoresists Industry Forecast” looks at past sales and reviews total world Photosensitive Materials for Photoresists sales in 2023, providing a comprehensive analysis by region and market sector of projected Photosensitive Materials for Photoresists sales for 2024 through 2030. With Photosensitive Materials for Photoresists sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Photosensitive Materials for Photoresists industry.

This Insight Report provides a comprehensive analysis of the global Photosensitive Materials for Photoresists landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Photosensitive Materials for Photoresists portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Photosensitive Materials for Photoresists market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Photosensitive Materials for Photoresists and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Photosensitive Materials for Photoresists.

The global market for semiconductor was estimated at US$ 526.8 billion in the year 2023, is projected to US$ 780.7 billion by 2030. IC Manufacturing is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM). According to our research, the global semiconductor manufacturing (wafer fabrication) market is projected to grow from US$ 251.7 billion in 2023 to US$ 506.5 billion by 2030, at a Compound Annual Growth Rate (CAGR) of 40.49% during the forecast period. This will drive rapid growth of global semiconductor Photoresists. The global Photoresist Raw Materials market is dominated by few companies from Japan, USA, Europe and South Korea.

This report presents a comprehensive overview, market shares, and growth opportunities of Photosensitive Materials for Photoresists market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:
Photo Acid Generator (PAG)
Photo Acid Compound (PAC)

Segmentation by Application:
EUV Photoresist
ArF Photoresist
KrF Photoresist
g/i-Line Photoresist

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Midori Kagaku
FUJIFILM Wako Pure Chemical Corporation
Toyo Gosei Co., Ltd
Adeka
IGM Resins B.V.
Heraeus Epurio
Miwon Commercial Co., Ltd.
Daito Chemix Corporation
CGP Materials
ENF Technology
NC Chem
TAKOMA TECHNOLOGY CORPORATION
Xuzhou B & C Chemical
Changzhou Tronly New Electronic Materials
Tianjin Jiuri New Material
Suzhou Weimas

Key Questions Addressed in this Report

What is the 10-year outlook for the global Photosensitive Materials for Photoresists market?

What factors are driving Photosensitive Materials for Photoresists market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do Photosensitive Materials for Photoresists market opportunities vary by end market size?

How does Photosensitive Materials for Photoresists break out by Type, by Application?



Please note: The report will take approximately 2 business days to prepare and deliver.