Global Metal Sputtering Target Market Growth (Status and Outlook) 2023-2029

Global Metal Sputtering Target Market Growth (Status and Outlook) 2023-2029

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. Metal Target Materials are kinds of sputtering targets and this report studies the Metal Target Material.
A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips. As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.
LPI (LP Information)' newest research report, the “Metal Sputtering Target Industry Forecast” looks at past sales and reviews total world Metal Sputtering Target sales in 2022, providing a comprehensive analysis by region and market sector of projected Metal Sputtering Target sales for 2023 through 2029. With Metal Sputtering Target sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Metal Sputtering Target industry.
This Insight Report provides a comprehensive analysis of the global Metal Sputtering Target landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Metal Sputtering Target portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Metal Sputtering Target market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Metal Sputtering Target and breaks down the forecast by type, by application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Metal Sputtering Target.
The global Metal Sputtering Target market size is projected to grow from US$ 3321.9 million in 2022 to US$ 5650.6 million in 2029; it is expected to grow at a CAGR of 7.9% from 2023 to 2029.
The global metal sputtering target development and production mainly concentrated in the Europe, United States and Japan, and the industry concentration is quite high. Manufactures of sputtering targets, represented by Materion (Heraeus), Mitsui Mining & Smelting, Praxair, JX Nippon Mining & Metals Corporation, Plansee SE, Hitachi Metals, Honeywell, Sumitomo Chemical, ULVAC and others. The Top 10 manufacturers accounted for 68.12% of the global revenue share in 2019.
Semiconductor chips, flat panel displays, solar cells and other downstream industries have a higher demand on the product quality and stability. The segment of semiconductor took about 38.93% of the revenue share in 2019, followed by the segment of flat panel display, which took about 35.56%.
This report presents a comprehensive overview, market shares, and growth opportunities of Metal Sputtering Target market by product type, application, key players and key regions and countries.
Market Segmentation:
Segmentation by type
Metal Target
Alloy Target
Segmentation by application
Semiconductor
Solar Energy
Flat Panel Display
Others
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analyzing the company's coverage, product portfolio, its market penetration.
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Hitachi Metals
Honeywell
Mitsui Mining & Smelting
Sumitomo Chemical
ULVAC
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
GRIKIN Advanced Material
FURAYA Metals
Advantec
Angstrom Sciences
Umicore Thin Film Products

Please note: The report will take approximately 2 business days to prepare and deliver.


*This is a tentative TOC and the final deliverable is subject to change.*
1 Scope of the Report
2 Executive Summary
3 Metal Sputtering Target Market Size by Player
4 Metal Sputtering Target by Regions
5 Americas
6 APAC
7 Europe
8 Middle East & Africa
9 Market Drivers, Challenges and Trends
10 Global Metal Sputtering Target Market Forecast
11 Key Players Analysis
12 Research Findings and Conclusion

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