Global High Purity Sputtering Target Material Market Growth (Status and Outlook) 2023-2029

Global High Purity Sputtering Target Material Market Growth (Status and Outlook) 2023-2029

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputter targets market.
In this report, we counted the high purity sputtering target material with 4N (purity≥99.99%)
LPI (LP Information)' newest research report, the “High Purity Sputtering Target Material Industry Forecast” looks at past sales and reviews total world High Purity Sputtering Target Material sales in 2022, providing a comprehensive analysis by region and market sector of projected High Purity Sputtering Target Material sales for 2023 through 2029. With High Purity Sputtering Target Material sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world High Purity Sputtering Target Material industry.
This Insight Report provides a comprehensive analysis of the global High Purity Sputtering Target Material landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on High Purity Sputtering Target Material portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global High Purity Sputtering Target Material market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for High Purity Sputtering Target Material and breaks down the forecast by type, by application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global High Purity Sputtering Target Material.
The global High Purity Sputtering Target Material market size is projected to grow from US$ 2511.6 million in 2022 to US$ 2920.5 million in 2029; it is expected to grow at a CAGR of 2.2% from 2023 to 2029.
Global major companies profiled in the High Purity Sputtering Target Material market include Linde, Mitsui Mining & Smelting, JX Nippon Mining & Metals Corporation, Materion, Honeywell, Konfoong Materials International Co., Ltd, etc. Global top six companies account for nearly 60% of market share.
Asia-Pacific is the largest market, with a share about 85%, followed by North America, has a share about 9 percent.
In terms of product, Metal Sputtering Target Material is the largest segment, with a share over 60%. And in terms of application, the largest application is Semiconductor, followed by Flat Panel Display, Solar Energy, HDD, etc.
This report presents a comprehensive overview, market shares, and growth opportunities of High Purity Sputtering Target Material market by product type, application, key players and key regions and countries.
Market Segmentation:
Segmentation by type
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material
Segmentation by application
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analyzing the company's coverage, product portfolio, its market penetration.
Linde
Mitsui Mining & Smelting
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Konfoong Materials International Co., Ltd
ULVAC
TOSOH
Luvata
Hitachi Metals
LT Metal
Sumitomo Chemical
Plansee SE
Fujian Acetron New Materials Co., Ltd
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
Umicore
GRIKIN Advanced Material Co., Ltd.
Advantec
Angstrom Sciences

Please note: The report will take approximately 2 business days to prepare and deliver.


*This is a tentative TOC and the final deliverable is subject to change.*
1 Scope of the Report
2 Executive Summary
3 High Purity Sputtering Target Material Market Size by Player
4 High Purity Sputtering Target Material by Regions
5 Americas
6 APAC
7 Europe
8 Middle East & Africa
9 Market Drivers, Challenges and Trends
10 Global High Purity Sputtering Target Material Market Forecast
11 Key Players Analysis
12 Research Findings and Conclusion

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