Global EUV Mask Defect Inspection Equipment Market Growth 2025-2031

Global EUV Mask Defect Inspection Equipment Market Growth 2025-2031

The global EUV Mask Defect Inspection Equipment market size is predicted to grow from US$ 1609 million in 2025 to US$ 3468 million in 2031; it is expected to grow at a CAGR of 13.7% from 2025 to 2031.

Mask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.

Mask defect detection is a key link in the semiconductor lithography process, which aims to check the Mask and identify and repair the defects on it. As a critical component in the lithography process, Mask is responsible for accurately transferring the circuit pattern to the wafer, and its quality is directly related to the accuracy of the wafer pattern and the performance of the final device. There are various types of defects, including particle contamination, pattern breakage, bridging problems, and defects in the mask material itself.

EUV Mask defect detection equipment is a special equipment that plays an important role in the high-end semiconductor process technology. Given the high precision required by EUV lithography technology, even the smallest defect on the Mask may significantly affect the quality of the circuit pattern on the wafer, and thus adversely affect the performance and yield of the chip. Therefore, the use of special detection equipment to strictly inspect the EUV Mask is an indispensable key link to ensure the quality of semiconductor manufacturing.

At present, optical detection is the mainstream in semiconductor detection technology. The types of semiconductor optical detection include pattern, non-pattern and mask detection. Among them, pattern defect detection is divided into bright field and dark field detection. Both are analyzed through optical signals. The difference is that the bright field is a vertically reflected light signal, while the dark field is a scattered light signal.

In the semiconductor lithography process, corresponding light sources need to be used for different masks. Different mask applications vary greatly, and can be generally divided into binary masks, phase-shift masks and EUV masks. EUV Mask is a new type of mask designed specifically for EUV (extreme ultraviolet) lithography technology. Given the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). This type of mask is widely used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.

At present, mask detection technology is mainly optical detection and SEM detection. Among them, the optical inspection companies are mainly Lasertec and KLA, while SEM inspection is Advantest. From the perspective of downstream applications, as long as the mask uses Pellicle, EUV Mask inspection equipment is required (in other words, as long as there is an EUV lithography machine, EUV inspection equipment must be used), but at present, not all EUV Masks of downstream terminal manufacturers will be used with Pellicle.

In DUV lithography or optical Mask technology, Pellicle plays a key role. The Mask inspection tool operates at an exposure wavelength of 193nm, and inspection is performed through this layer of film. For the wafer fab, this is a direct and efficient process. However, in extreme ultraviolet (EUV) lithography technology, the manufacturing process of the Mask needs to be carried out in a dedicated Mask workshop. At this point, the inspection of the Mask becomes more complicated because it requires a high-resolution system. In the wafer fab environment, the ideal situation is to use a layer of Pellicle to protect the Mask from particle contamination, while allowing the inspection system to work through this layer of Pellicle. If there are no defects, you can proceed; if defects are detected, you need to remove the pellicle and send the Mask to the Mask workshop for cleaning.

EUV Mask defect detection equipment is mainly used in Mask Shop and Fab. The Fab includes the mask production line and the wafer manufacturing production line. For the Fab, there are two main reasons for using EUV Mask defect detection equipment. First, once the pellicle is attached to the Mask, other types of equipment (such as electron beam or DUV equipment) except EUV detection equipment are difficult to achieve high-sensitivity detection effects. This is because the presence of pellicles interferes with the detection capabilities of these devices, making it difficult for them to accurately identify tiny defects. Secondly, EUV detection equipment has higher detection accuracy and can detect defects and particles that traditional DUV Mask detection methods cannot capture. Mask Shop has always had a relatively large share, reaching about 61% in 2023. However, with the acceleration of commercialization of smaller advanced process nodes, it is expected that the share of Fab will reach 42% by 2030.

At present, the EUV Mask defect detection equipment market is mainly monopolized by KLA and Lasertec. EUV Mask defect detection equipment is a high-precision and advanced equipment with a long delivery time. For example, Lasertec's delivery time is two years. In the next few years, the two leading companies will still maintain a monopoly in the EUV Mask defect detection market.

LP Information, Inc. (LPI) ' newest research report, the “EUV Mask Defect Inspection Equipment Industry Forecast” looks at past sales and reviews total world EUV Mask Defect Inspection Equipment sales in 2024, providing a comprehensive analysis by region and market sector of projected EUV Mask Defect Inspection Equipment sales for 2025 through 2031. With EUV Mask Defect Inspection Equipment sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world EUV Mask Defect Inspection Equipment industry.

This Insight Report provides a comprehensive analysis of the global EUV Mask Defect Inspection Equipment landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on EUV Mask Defect Inspection Equipment portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global EUV Mask Defect Inspection Equipment market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for EUV Mask Defect Inspection Equipment and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global EUV Mask Defect Inspection Equipment.

This report presents a comprehensive overview, market shares, and growth opportunities of EUV Mask Defect Inspection Equipment market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:
5-7nm Process
3nm and Below Process

Segmentation by Application:
Mask Shop
Fab

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Lasertec
KLA-Tencor
Advantest

Key Questions Addressed in this Report

What is the 10-year outlook for the global EUV Mask Defect Inspection Equipment market?

What factors are driving EUV Mask Defect Inspection Equipment market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do EUV Mask Defect Inspection Equipment market opportunities vary by end market size?

How does EUV Mask Defect Inspection Equipment break out by Type, by Application?

Please note: The report will take approximately 2 business days to prepare and deliver.