The global EUV Light Sources market size is predicted to grow from US$ 227 million in 2025 to US$ 378 million in 2031; it is expected to grow at a CAGR of 8.9% from 2025 to 2031.
EUV light source is the core component of EUV lithography machine and is also used in EUV mask inspection equipment. EUV light source refers to extreme ultraviolet light with a wavelength of 10 to 14 nanometers, and the specific commonly used wavelength is 13.5 nanometers.The EUV (extreme ultraviolet) light source system consists of three core units: light generation, light collection, and spectrum purification and homogenization. The key components of the system include high-performance CO2 lasers as light sources, multi-layer coated mirrors, load devices, high-efficiency light collectors, precision masks, and projection optical systems (using Xe or Sn to form plasma). In this process, the plasma effectively purifies the energy spectrum through the multiple reflection mechanism of the multi-layer film mirror, and finally produces EUV light with a wavelength of 13.5nm.
The mainstream EUV light source suppliers are mainly Cymer, Gigaphoton, etc. Ushio's EUV light source is used in Lasertec's ACTIS mask defect detection equipment. In the semiconductor lithography process, corresponding light sources are required for different masks. The applications of different masks vary greatly, and can be generally divided into binary masks, phase-shift masks, and EUV masks. EUV masks are new masks designed specifically for EUV (extreme ultraviolet) lithography technology. In view of the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). EUV is mainly used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
LP Information, Inc. (LPI) ' newest research report, the “EUV Light Sources Industry Forecast” looks at past sales and reviews total world EUV Light Sources sales in 2024, providing a comprehensive analysis by region and market sector of projected EUV Light Sources sales for 2025 through 2031. With EUV Light Sources sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world EUV Light Sources industry.
This Insight Report provides a comprehensive analysis of the global EUV Light Sources landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on EUV Light Sources portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global EUV Light Sources market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for EUV Light Sources and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global EUV Light Sources.
This report presents a comprehensive overview, market shares, and growth opportunities of EUV Light Sources market by product type, application, key manufacturers and key regions and countries.
Segmentation by Type:
Low Power
High Power
Segmentation by Application:
Equipment Factory
Fab
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Cymer
Gigaphoton
Ushio
ISTEQ BV
Key Questions Addressed in this Report
What is the 10-year outlook for the global EUV Light Sources market?
What factors are driving EUV Light Sources market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do EUV Light Sources market opportunities vary by end market size?
How does EUV Light Sources break out by Type, by Application?
Please note: The report will take approximately 2 business days to prepare and deliver.
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