Global CMP Polishing Slurry Market Growth 2025-2031

The global CMP Polishing Slurry market size is predicted to grow from US$ 2086 million in 2025 to US$ 3522 million in 2031; it is expected to grow at a CAGR of 9.1% from 2025 to 2031.

Chemical mechanical polishing/planarization (CMP) slurries are abrasive materials, also called non-crystalline inorganic oxides, which are dispersed in water blended with other chemicals and used in CMP processes for semiconductors. CMP process is employed in semiconductor manufacturing, where surfaces of wafers are smoothed and leveled with the help of abrasive slurries. This process is critical for precise lithography patterning, and is utilized after every deposition-etch step.

CMP slurries are liquid solutions generally composed of high-purity deionized water and a proprietary mix of chemical additives and engineered abrasives that chemically and mechanically interact at an atomic level with the surface material of the IC device.

CMP slurries for polishing a wide range of materials used in semiconductors, including tungsten, dielectric materials, copper, tantalum (commonly referred to as “barrier”), aluminum, silicon carbide, or SiC, and gallium nitride, or GaN.

Global key players of CMP Slurry include CMC Materials, Fujimi Incorporated, Resonac, Anjimirco Shanghai, Merck KGaA (Versum Materials), etc. The top five players hold a share about 65%. China is the largest market, and has a share about 44%, followed by South Korea and North America with share 18% and 13%, separately. In terms of product type, Colloidal Silica CMP Slurry is the largest segment, accounting for a share of 74%. In terms of application, Silicon Wafer & IC CMP Slurry is the largest field with a share about 88 percent.

LP Information, Inc. (LPI) ' newest research report, the “CMP Polishing Slurry Industry Forecast” looks at past sales and reviews total world CMP Polishing Slurry sales in 2024, providing a comprehensive analysis by region and market sector of projected CMP Polishing Slurry sales for 2025 through 2031. With CMP Polishing Slurry sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world CMP Polishing Slurry industry.

This Insight Report provides a comprehensive analysis of the global CMP Polishing Slurry landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on CMP Polishing Slurry portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global CMP Polishing Slurry market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for CMP Polishing Slurry and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global CMP Polishing Slurry.

This report presents a comprehensive overview, market shares, and growth opportunities of CMP Polishing Slurry market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:

Alumina CMP Slurry

Colloidal Silica CMP Slurry

Ceria CMP Slurries

Segmentation by Application:

Silicon Wafer & IC CMP Slurry

SiC Wafer

Optical Substrates

Disk-drive Components

Others

This report also splits the market by region:

Americas

United States

Canada

Mexico

Brazil

APAC

China

Japan

Korea

Southeast Asia

India

Australia

Europe

Germany

France

UK

Italy

Russia

Middle East & Africa

Egypt

South Africa

Israel

Turkey

GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.

Resonac

Fujimi Incorporated

DuPont

Merck KGaA (Versum Materials)

Fujifilm

AGC

KC Tech

JSR Corporation

Anjimirco Shanghai

Soulbrain

Saint-Gobain

TOPPAN INFOMEDIA

Ace Nanochem

Dongjin Semichem

Vibrantz (Ferro)

WEC Group

SKC (SK Enpulse)

Shanghai Xinanna Electronic Technology

Hubei Dinglong

Beijing Hangtian Saide

Engis Corporation

Shenzhen Angshite Technology

CHUANYAN

Samsung SDI

Zhuhai Cornerstone Technologies

Zhejiang Bolai Narun Electronic Materials

Key Questions Addressed in this Report

What is the 10-year outlook for the global CMP Polishing Slurry market?

What factors are driving CMP Polishing Slurry market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do CMP Polishing Slurry market opportunities vary by end market size?

How does CMP Polishing Slurry break out by Type, by Application?

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