Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size, Share & Industry Trends Analysis Report By Equipment (Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks), By Regional Outlook and Forecast, 202

Global Extreme Ultraviolet Lithography (EUVL) Systems Market Size, Share & Industry Trends Analysis Report By Equipment (Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Mirrors, Masks), By Regional Outlook and Forecast, 2022 - 2028

The Global Extreme Ultraviolet Lithography (EUVL) Systems Market size is expected to reach $23.05 billion by 2028, rising at a market growth of 21.3 % CAGR during the forecast period.

Extreme ultraviolet lithography, or EUVL, is one of the leading next-generation lithography (NGL) techniques used to print lines as thin as 30 nm and create microprocessors and microchips. This novel and advanced technology are significantly being employed to design microcircuits. Strong ultraviolet laser beams that are reflected off of a silicon wafer are burned into the silicon wafer by the EUVL technology. A further extremely short wavelength solution that can be used up to the 10nm node is extreme UV lithography systems.

Extreme ultraviolet lithography is an optical lithography process that creates patterns by exposing reflective photomask to UV light, which is reflected onto a substrate covered in the photoresist. This process uses a range of extreme ultraviolet wavelengths, approximately encompassing a 2% FWHM bandwidth of about 13.5 nm. It is frequently used in the process of creating semiconductor devices.

Because EUVL systems are more advanced technologically than other lithography methods, the market for them is anticipated to develop significantly throughout the coming years. Additionally, the market for extreme-ultraviolet lithography technologies is anticipated to rise due to the imminent need for smaller electronic devices. Additionally, an increase in microelectronics device sales is anticipated to fuel the market for extreme-ultraviolet lithography equipment in the coming years.

By reflecting light, several alternating layers of silicon and molybdenum are used to create EUV photomasks. In contrast, traditional photomasks block the light using a single layer of chromium on a quartz substrate. A EUV mask is made up of 40 layers of silicon and molybdenum that alternate, acting as a multilayer to reflect the extreme ultraviolet light via Bragg diffraction. The wavelength and incident angle have a significant impact on the reflectance, with shorter wavelengths reflecting away from normal incidence and longer wavelengths reflecting near-normal incidence.

COVID-19 Impact Analysis

Due to a major impact on key companies in the supply chain, the COVID-19 outbreak had a significant impact on the growth of the extreme ultraviolet lithography systems market. In addition, the COVID-19 pandemic caused a number of challenges for the market, including a shortage of competent workers and delays or cancellations of projects due to full or partial lockdown, globally. Moreover, the transmission of coronavirus was rapid, and the semiconductor industry was been shut down entirely due to the lockdown imposed by governments of various countries. Because industrial automation tools boost corporate efficiency and cut labor expenses, many businesses use them in their operations.

Market Growth Factors

Rising Utilization Of Smartphones

The technological infrastructure, information and communication technologies available to the service to be offered, the access of the end-users to the service, and the service's usability are only a few of the factors that need to be considered while developing smart services. Additionally, there are other reasons that are readily available, such as the quick expansion of smart devices, the excellence of mobile networks, and the rising need for highly effective smart applications. The essential principles in the framework for smart government must be used when providing information services via mobile phones and smart platforms.

Increasing Growth Of The Pharmaceuticals Industry

With the introduction of new technology as well as more economical and effective manufacturing techniques, the pharmaceutical industry has experienced a significant transition. Additionally, the market growth has been positively driven by rising investment flow in this sector. The use of robotics and artificial intelligence reduces downtime on the manufacturing floor and the production of product waste (AI). Additionally, single-use disposable products have been launched in this market, replacing traditional open transfer manufacturing methods. Additionally, the paradigm change towards integrated, intelligent, and data-rich paperless operations has produced accurate and error-free output. Such continuous discoveries have accelerated the production of drugs.

Market Restraining Factors

Prevalence Of Alternatives Across The Market

An image is projected into a photosensitive emulsion that has been put on a substrate, such as a silicon wafer, in the process of optical lithography, a photon-based process. The semiconductor industry uses this optical lithography technique the most for producing Nano-electronics in large quantities. The widespread usage of optical lithography is directly related to the technology's extremely parallel architecture, which enables the quick transport of enormous volumes of data. For instance, cutting-edge lithography equipment today can print 150–300 mm wafers per hour with a 40–nm two–dimensional pattern resolution, which results in a throughput of about 1.8T pixels/s.

Equipment Outlook

By the Equipment, the Extreme Ultraviolet Lithography Systems Market is segregated into Mask, Light Source, Mirrors, and Others. In 2021, the mirrors segment witnessed a substantial revenue share of the extreme ultraviolet lithography systems market. For extreme ultraviolet lithography, there are no lenses. The lenses would absorb the light in the system because most materials absorb EUV light. In modern systems, manufacturers are integrating a new optical system that utilizes multilayer mirrors that are ultra-smooth in a vacuum chamber.

Regional Outlook

Region-Wise, the Extreme Ultraviolet Lithography Systems Market is analyzed across North America, Europe, Asia-Pacific, and LAMEA. In 2021, Asia Pacific accounted for the highest revenue share of the extreme ultraviolet lithography market. The surging growth of the regional market is attributed to the constantly expanding semiconductor industry of the region. China in particular continues to be a prominent player in the market for extreme-ultraviolet lithography systems in Asia-Pacific. Major businesses and government agencies in the nation are heavily investing in technology, which is also a major factor driving the growth of the segment.

The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Intel Corporation, Samsung Electronics Co., Ltd. (Samsung Group), Toshiba Corporation, Carl Zeiss AG, Nikon Corporation, ASML Holding N.V., Canon, Inc., Taiwan Semiconductor Manufacturing Company Limited, Toppan Inc., and NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation).

Scope of the Study

Market Segments covered in the Report:

By Equipment

  • Light Source
Laser Produced Plasmas (LPP)

Vacuum Sparks

Gas Discharges
  • Mirrors
  • Masks
  • Others
By Geography
  • North America
US

Canada

Mexico

Rest of North America
  • Europe
Germany

UK

France

Russia

Spain

Italy

Rest of Europe
  • Asia Pacific
China

Japan

India

South Korea

Singapore

Malaysia

Rest of Asia Pacific
  • LAMEA
Brazil

Argentina

UAE

Saudi Arabia

South Africa

Nigeria

Rest of LAMEA

Companies Profiled
  • Intel Corporation
  • Samsung Electronics Co., Ltd. (Samsung Group)
  • Toshiba Corporation
  • Carl Zeiss AG
  • Nikon Corporation
  • ASML Holding N.V.
  • Canon, Inc.
  • Taiwan Semiconductor Manufacturing Company Limited
  • Toppan Inc.
  • NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
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Chapter 1. Market Scope & Methodology
1.1 Market Definition
1.2 Objectives
1.3 Market Scope
1.4 Segmentation
1.4.1 Global Extreme Ultraviolet Lithography (EUVL) Systems Market, by Equipment
1.4.2 Global Extreme Ultraviolet Lithography (EUVL) Systems Market, by Geography
1.5 Methodology for the research
Chapter 2. Market Overview
2.1 Introduction
2.1.1 Overview
2.1.1.1 Market composition and scenario
2.2 Key Factors Impacting the Market
2.2.1 Market Drivers
2.2.2 Market Restraints
Chapter 3. Competition Analysis – Global
3.1 Market Share Analysis, 2021
Chapter 4. Global Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
4.1 Global Light Source Market by Region
4.2 Global Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source Type
4.2.1 Global Laser Produced Plasmas (LPP) Market by Region
4.2.2 Global Vacuum Sparks Market by Region
4.2.3 Global Gas Discharges Market by Region
4.3 Global Mirrors Market by Region
4.4 Global Masks Market by Region
4.5 Global Others Market by Region
Chapter 5. Global Extreme Ultraviolet Lithography (EUVL) Systems Market by Region
5.1 North America Extreme Ultraviolet Lithography (EUVL) Systems Market
5.1.1 North America Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.1.1.1 North America Light Source Market by Country
5.1.1.2 North America Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source Type
5.1.1.2.1 North America Laser Produced Plasmas (LPP) Market by Country
5.1.1.2.2 North America Vacuum Sparks Market by Country
5.1.1.2.3 North America Gas Discharges Market by Country
5.1.1.3 North America Mirrors Market by Country
5.1.1.4 North America Masks Market by Country
5.1.1.5 North America Others Market by Country
5.1.2 North America Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
5.1.2.1 US Extreme Ultraviolet Lithography (EUVL) Systems Market
5.1.2.1.1 US Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.1.2.2 Canada Extreme Ultraviolet Lithography (EUVL) Systems Market
5.1.2.2.1 Canada Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.1.2.3 Mexico Extreme Ultraviolet Lithography (EUVL) Systems Market
5.1.2.3.1 Mexico Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.1.2.4 Rest of North America Extreme Ultraviolet Lithography (EUVL) Systems Market
5.1.2.4.1 Rest of North America Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2 Europe Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.1 Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.1.1 Europe Light Source Market by Country
5.2.1.2 Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source Type
5.2.1.2.1 Europe Laser Produced Plasmas (LPP) Market by Country
5.2.1.2.2 Europe Vacuum Sparks Market by Country
5.2.1.2.3 Europe Gas Discharges Market by Country
5.2.1.3 Europe Mirrors Market by Country
5.2.1.4 Europe Masks Market by Country
5.2.1.5 Europe Others Market by Country
5.2.2 Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
5.2.2.1 Germany Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.1.1 Germany Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.2.2 UK Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.2.1 UK Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.2.3 France Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.3.1 France Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.2.4 Russia Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.4.1 Russia Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.2.5 Spain Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.5.1 Spain Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.2.6 Italy Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.6.1 Italy Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.2.2.7 Rest of Europe Extreme Ultraviolet Lithography (EUVL) Systems Market
5.2.2.7.1 Rest of Europe Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3 Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.1 Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.1.1 Asia Pacific Light Source Market by Country
5.3.1.2 Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source Type
5.3.1.2.1 Asia Pacific Laser Produced Plasmas (LPP) Market by Country
5.3.1.2.2 Asia Pacific Vacuum Sparks Market by Country
5.3.1.2.3 Asia Pacific Gas Discharges Market by Country
5.3.1.3 Asia Pacific Mirrors Market by Country
5.3.1.4 Asia Pacific Masks Market by Country
5.3.1.5 Asia Pacific Others Market by Country
5.3.2 Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
5.3.2.1 China Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.1.1 China Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.2.2 Japan Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.2.1 Japan Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.2.3 India Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.3.1 India Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.2.4 South Korea Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.4.1 South Korea Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.2.5 Singapore Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.5.1 Singapore Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.2.6 Malaysia Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.6.1 Malaysia Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.3.2.7 Rest of Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market
5.3.2.7.1 Rest of Asia Pacific Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4 LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.1 LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.1.1 LAMEA Light Source Market by Country
5.4.1.2 LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source Type
5.4.1.2.1 LAMEA Laser Produced Plasmas (LPP) Market by Country
5.4.1.2.2 LAMEA Vacuum Sparks Market by Country
5.4.1.2.3 LAMEA Gas Discharges Market by Country
5.4.1.3 LAMEA Mirrors Market by Country
5.4.1.4 LAMEA Masks Market by Country
5.4.1.5 LAMEA Others Market by Country
5.4.2 LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Country
5.4.2.1 Brazil Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.1.1 Brazil Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.2.2 Argentina Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.2.1 Argentina Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.2.3 UAE Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.3.1 UAE Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.2.4 Saudi Arabia Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.4.1 Saudi Arabia Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.2.5 South Africa Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.5.1 South Africa Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.2.6 Nigeria Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.6.1 Nigeria Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
5.4.2.7 Rest of LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market
5.4.2.7.1 Rest of LAMEA Extreme Ultraviolet Lithography (EUVL) Systems Market by Equipment
Chapter 6. Company Profiles
6.1 Intel Corporation
6.1.1 Company Overview
6.1.2 Financial Analysis
6.1.3 Segmental and Regional Analysis
6.1.4 Research & Development Expenses
6.1.5 SWOT Analysis
6.2 Samsung Electronics Co., Ltd. (Samsung Group)
6.2.1 Company Overview
6.2.2 Financial Analysis
6.2.3 Segmental and Regional Analysis
6.2.4 Research & Development Expense
6.2.5 Recent strategies and developments:
6.2.5.1 Business Expansions:
6.2.6 SWOT Analysis
6.3 Toshiba Corporation
6.3.1 Company Overview
6.3.2 Financial Analysis
6.3.3 Segmental and Regional Analysis
6.3.4 Research and Development Expense
6.3.5 SWOT Analysis
6.4 Carl Zeiss AG
6.4.1 Company Overview
6.4.2 Financial Analysis
6.4.3 Segmental and Regional Analysis
6.4.4 Research & Development Expenses
6.5 Nikon Corporation
6.5.1 Company Overview
6.5.2 Financial Analysis
6.5.3 Segmental and Regional Analysis
6.5.4 Research & Development Expense
6.6 ASML Holding N.V.
6.6.1 Company Overview
6.6.2 Financial Analysis
6.6.3 Regional Analysis
6.6.4 Research & Development Expenses
6.7 Canon, Inc.
6.7.1 Company Overview
6.7.2 Financial Analysis
6.7.3 Segmental and Regional Analysis
6.7.4 Research & Development Expenses
6.8 Taiwan Semiconductor Manufacturing Company Limited
6.8.1 Company overview
6.8.2 inancial Analysis
6.8.3 Regional Analysis
6.8.4 Research & Development Expenses
6.9 Toppan Inc.
6.9.1 Company Overview
6.9.2 Financial Analysis
6.9.3 Segmental and Regional Analysis
6.9.4 Research & Development Expenses
6.10. NTT Advanced Technology Corporation (Nippon Telegraph and Telephone Corporation)
6.10.1 Company Overview
6.10.2 Financial Analysis
6.10.3 Segmental Analysis

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