Chemical Vapour Deposition (CVD) Equipment Market Report by Technology (Plasma Enhanced CVD (PECVD), Low Pressure CVD (LPCVD), Metal Organic CVD (MOCVD), Atmospheric Pressure CVD (APCVD), and Others), Application (Coatings, Electronics, Catalysis, and Others), End User (Memory, Foundry, IDM, Logic), and Region 2024-2032
The global chemical vapour deposition (CVD) equipment market size reached US$ 30.5 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 58.3 Billion by 2032, exhibiting a growth rate (CAGR) of 7.25% during 2024-2032. Significant growth in the electronics industry, the increasing demand for CVD equipment in medical applications, and extensive research and development (R&D) activities represent some of the key factors driving the market.
A chemical vapor deposition (CVD) system is used to deposit thin films of various materials onto a substrate using gaseous reagents and thermally induced chemical reactions. The equipment typically consists of a reaction chamber, gas delivery system, energy source, vacuum system, heating system, and exhaust system. CVD equipment is widely used in the coatings and semiconductor industry to make materials that are used to produce solar panels, light-emitting diodes, and integrated circuits (ICs). The equipment produces high-quality, uniform films with excellent film purity, thickness, composition, and microstructure control. CVD equipment is a powerful tool that exhibits versatility, low-temperature deposition, high production rates, and low waste generation. As a result, it finds extensive applications across the electronics, coatings, and catalysis industries.
Chemical Vapour Deposition (CVD) Equipment Market Trends:
The widespread product adoption in the electronics industry across the globe is one of the key factors driving the market growth. CVD equipment is widely used in the designing and processing of advanced electronic conductors and insulators, as well as related structures, such as diffusion barriers and high thermal conductivity substrates (heat sinks). In line with this, the increasing demand for microelectronic components such as microchips, transistors, and sensors are favoring the market growth. Moreover, the rising demand for CVD equipment in the production of flat panel displays, laptops, storage devices, mobile phones, and other electronic items is acting as another growth-inducing factor. Apart from this, the introduction of the plasma-enhanced CVD (PECVD) technique to deposit materials at lower substrate temperatures helps to reduce the thermal stress on the substrate and allows for the use of temperature-sensitive materials, which in turn is providing an impetus to the market growth. Additionally, the widespread equipment utilization for a wide range of applications in solar cell manufacture, such as crystalline silicon deposition in crystalline-silicon solar cells to the deposition of a variety of materials in thin high-performance film solar cells, is propelling the market growth. Furthermore, the launch of multi-chamber CVD equipment, which helps in the deposition of multiple materials in a single process that assists in increasing efficiency and reducing manufacturing time, which in turn is creating a positive outlook for the market. Other factors, including the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities, rising demand for coatings in various industries, and the implementation of various government initiatives to encourage domestic manufacturing, are anticipated to drive the market growth.
Key Market Segmentation:
IMARC Group provides an analysis of the key trends in each segment of the global chemical vapour deposition (CVD) equipment market, along with forecasts at the global, regional, and country levels from 2024-2032. Our report has categorized the market based on technology, application, and end user.
Technology Insights:
Plasma Enhanced CVD (PECVD)
Low Pressure CVD (LPCVD)
Metal Organic CVD (MOCVD)
Atmospheric Pressure CVD (APCVD)
Others
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the technology. This includes plasma enhanced CVD (PECVD), low pressure CVD (LPCVD), metal organic CVD (MOCVD), atmospheric pressure CVD (APCVD) and others. According to the report, low pressure CVD (LPCVD) represented the largest segment.
Application Insights:
Coatings
Electronics
Catalysis
Others
A detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the application has also been provided in the report. This includes coatings, electronics, catalysis, and others. According to the report, electronics accounted for the largest market share.
End User Insights:
Memory
Foundry
IDM
Logic
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the end user. This includes memory, foundry, IDM, and logic. According to the report, foundry represented the largest segment.
Regional Insights:
North America
United States
Canada
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Asia Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The report has also provided a comprehensive analysis of all the major regional markets, which include North America (the United States and Canada); Europe (Germany, France, the United Kingdom, Italy, Spain, Russia, and others); Asia Pacific (China, Japan, India, South Korea, Australia, Indonesia, and others); Latin America (Brazil, Mexico, and others); and the Middle East and Africa. According to the report, Asia Pacific was the largest market for chemical vapour deposition (CVD) equipment. Some of the factors driving the Asia Pacific chemical vapour deposition (CVD) equipment market included the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities and rapid technological advancements.
Competitive Landscape:
The report has also provided a comprehensive analysis of the competitive landscape in the global chemical vapour deposition (CVD) equipment market. Detailed profiles of all major companies have also been provided. Some of the companies covered include Aixtron SE, Applied Materials Inc., CVD Equipment Corporation, IHI Corporation, Jusung Engineering Co. Ltd., Lam Research Corporation, Oxford Instruments plc, Plasma-Therm LLC, ULVAC Inc., Veeco Instruments Inc., etc. Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.
Key Questions Answered in This Report:
How has the global chemical vapour deposition (CVD) equipment market performed so far, and how will it perform in the coming years?
What are the drivers, restraints, and opportunities in the global chemical vapour deposition (CVD) equipment market?
What is the impact of each driver, restraint, and opportunity on the global chemical vapour deposition (CVD) equipment market?
What are the key regional markets?
Which countries represent the most attractive chemical vapour deposition (CVD) equipment market?
What is the breakup of the market based on the technology?
Which is the most attractive technology in the chemical vapour deposition (CVD) equipment market?
What is the breakup of the market based on the application?
Which is the most attractive application in the chemical vapour deposition (CVD) equipment market?
What is the breakup of the market based on the end user?
Which is the most attractive end user in the chemical vapour deposition (CVD) equipment market?
What is the competitive structure of the global chemical vapour deposition (CVD) equipment market?
Who are the key players/companies in the global chemical vapour deposition (CVD) equipment market?