Global Reactive Ion Etching (RIE) Supply, Demand and Key Producers, 2024-2030

Global Reactive Ion Etching (RIE) Supply, Demand and Key Producers, 2024-2030

The global Reactive Ion Etching (RIE) market size is expected to reach $ million by 2030, rising at a market growth of % CAGR during the forecast period (2024-2030).

Reactive Ion Etching (RIE) is a dry etching technique widely used in semiconductor manufacturing, MEMS fabrication, microfabrication and nanotechnology to create patterns on the surface of various materials with high resolution and anisotropy. Unlike wet etching methods involving chemical reactions with liquid etchants, RIE uses reactive gases in a plasma state to chemically and physically remove the material from the surface. The use of reactive gases enables RIE to offer better control and precision over the etching process compared to other methods. The RIE process starts by placing a substrate, typically a silicon wafer covered with a patterned mask, inside a vacuum chamber. Reactive gases are then introduced into the chamber, and plasma is generated by applying an electric field using electrodes. The plasma consists of a mixture of ions, free electrons, and neutral particles. The electric field accelerates the ions in the plasma towards the substrate, resulting in both chemical reactions and physical sputtering at the surface. The combination of these two mechanisms removes the material selectively to create the desired pattern. One of the most significant benefits of RIE over other chemical etching methods is its ability to achieve high etch rates and anisotropy. The ion bombardment in RIE allows better control of the etching direction compared to isotropic plasma etching. The direction control results in sharp and well-defined features with minimal undercutting. Additionally, RIE is a versatile technique that can be used on materials including metals, semiconductors, and insulators in several applications. Furthermore, RIE etching is a dry etching method that avoids drawbacks associated with wet etching like contamination and the handling of hazardous chemicals.

This report studies the global Reactive Ion Etching (RIE) production, demand, key manufacturers, and key regions.

This report is a detailed and comprehensive analysis of the world market for Reactive Ion Etching (RIE), and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2023 as the base year. This report explores demand trends and competition, as well as details the characteristics of Reactive Ion Etching (RIE) that contribute to its increasing demand across many markets.

Highlights and key features of the study

Global Reactive Ion Etching (RIE) total production and demand, 2019-2030, (K Units)

Global Reactive Ion Etching (RIE) total production value, 2019-2030, (USD Million)

Global Reactive Ion Etching (RIE) production by region & country, production, value, CAGR, 2019-2030, (USD Million) & (K Units)

Global Reactive Ion Etching (RIE) consumption by region & country, CAGR, 2019-2030 & (K Units)

U.S. VS China: Reactive Ion Etching (RIE) domestic production, consumption, key domestic manufacturers and share

Global Reactive Ion Etching (RIE) production by manufacturer, production, price, value and market share 2019-2024, (USD Million) & (K Units)

Global Reactive Ion Etching (RIE) production by Type, production, value, CAGR, 2019-2030, (USD Million) & (K Units)

Global Reactive Ion Etching (RIE) production by Application production, value, CAGR, 2019-2030, (USD Million) & (K Units).

This reports profiles key players in the global Reactive Ion Etching (RIE) market based on the following parameters – company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Lam Research, Oxford Instruments, PlasmaTherm, SAMCO Inc., Applied Materials, Inc., ULTECH, Weina and SENTECH Instruments GmbH, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Reactive Ion Etching (RIE) market.

Detailed Segmentation:

Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (K Units) and average price (US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2019-2030 by year with 2023 as the base year, 2024 as the estimate year, and 2025-2030 as the forecast year.

Global Reactive Ion Etching (RIE) Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World

Global Reactive Ion Etching (RIE) Market, Segmentation by Type
Load-lock ICP Etch Systems
Atmospheric Cassette ICP-RIE Systems

Global Reactive Ion Etching (RIE) Market, Segmentation by Application
Semiconductor Manufacturing
MEMS Fabrication
Nanotechnology and Nanofabrication
Photonics and Optoelectronics
Surface Modification and Functionalization

Companies Profiled:
Lam Research
Oxford Instruments
PlasmaTherm
SAMCO Inc.
Applied Materials, Inc.
ULTECH
Weina
SENTECH Instruments GmbH

Key Questions Answered

1. How big is the global Reactive Ion Etching (RIE) market?

2. What is the demand of the global Reactive Ion Etching (RIE) market?

3. What is the year over year growth of the global Reactive Ion Etching (RIE) market?

4. What is the production and production value of the global Reactive Ion Etching (RIE) market?

5. Who are the key producers in the global Reactive Ion Etching (RIE) market?