Global Metal Sputtering Target Market 2024 by Company, Regions, Type and Application, Forecast to 2030

Global Metal Sputtering Target Market 2024 by Company, Regions, Type and Application, Forecast to 2030

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. Metal Target Materials are kinds of sputtering targets and this report studies the Metal Target Material.

A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the sputtering target material, which begins as a solid, is broken up by gaseous ions into tiny particles that form a spray and coat another material, which is known as the substrate. Sputter deposition is commonly involved in the creation of semiconductors and computer chips. As a result, most sputtering target materials are metallic elements or alloys, although there are some ceramic targets available that create hardened thin coatings for various tools.

According to our (Global Info Research) latest study, the global Metal Sputtering Target market size was valued at US$ 3782 million in 2023 and is forecast to a readjusted size of USD 6209 million by 2030 with a CAGR of 7.4% during review period.

The global metal sputtering target development and production mainly concentrated in the Europe, United States and Japan, and the industry concentration is quite high. Manufactures of sputtering targets, represented by Materion (Heraeus), Mitsui Mining & Smelting, Praxair, JX Nippon Mining & Metals Corporation, Plansee SE, Hitachi Metals, Honeywell, Sumitomo Chemical, ULVAC and others. The Top 10 manufacturers accounted for 68.12% of the global revenue share in 2019.

Semiconductor chips, flat panel displays, solar cells and other downstream industries have a higher demand on the product quality and stability. The segment of semiconductor took about 38.93% of the revenue share in 2019, followed by the segment of flat panel display, which took about 35.56%.

This report is a detailed and comprehensive analysis for global Metal Sputtering Target market. Both quantitative and qualitative analyses are presented by company, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2024, are provided.

Key Features:

Global Metal Sputtering Target market size and forecasts, in consumption value ($ Million), 2019-2030

Global Metal Sputtering Target market size and forecasts by region and country, in consumption value ($ Million), 2019-2030

Global Metal Sputtering Target market size and forecasts, by Type and by Application, in consumption value ($ Million), 2019-2030

Global Metal Sputtering Target market shares of main players, in revenue ($ Million), 2019-2024

The Primary Objectives in This Report Are:

To determine the size of the total market opportunity of global and key countries

To assess the growth potential for Metal Sputtering Target

To forecast future growth in each product and end-use market

To assess competitive factors affecting the marketplace

This report profiles key players in the global Metal Sputtering Target market based on the following parameters - company overview, revenue, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Hitachi Metals, Honeywell, Mitsui Mining & Smelting, Sumitomo Chemical, ULVAC, TOSOH, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Market segmentation

Metal Sputtering Target market is split by Type and by Application. For the period 2019-2030, the growth among segments provides accurate calculations and forecasts for Consumption Value by Type and by Application. This analysis can help you expand your business by targeting qualified niche markets.

Market segmentation

Metal Sputtering Target market is split by Type and by Application. For the period 2018-2029, the growth among segments provides accurate calculations and forecasts for Consumption Value by Type and by Application. This analysis can help you expand your business by targeting qualified niche markets.

Market segment by Type
Metal Target
Alloy Target

Market segment by Application
Semiconductor
Solar Energy
Flat Panel Display
Others

Market segment by players, this report covers
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Hitachi Metals
Honeywell
Mitsui Mining & Smelting
Sumitomo Chemical
ULVAC
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
GRIKIN Advanced Material
FURAYA Metals
Advantec
Angstrom Sciences
Umicore Thin Film Products

Market segment by regions, regional analysis covers

North America (United States, Canada and Mexico)

Europe (Germany, France, UK, Russia, Italy and Rest of Europe)

Asia-Pacific (China, Japan, South Korea, India, Southeast Asia and Rest of Asia-Pacific)

South America (Brazil, Rest of South America)

Middle East & Africa (Turkey, Saudi Arabia, UAE, Rest of Middle East & Africa)

The content of the study subjects, includes a total of 13 chapters:

Chapter 1, to describe Metal Sputtering Target product scope, market overview, market estimation caveats and base year.

Chapter 2, to profile the top players of Metal Sputtering Target, with revenue, gross margin, and global market share of Metal Sputtering Target from 2019 to 2024.

Chapter 3, the Metal Sputtering Target competitive situation, revenue, and global market share of top players are analyzed emphatically by landscape contrast.

Chapter 4 and 5, to segment the market size by Type and by Application, with consumption value and growth rate by Type, by Application, from 2019 to 2030.

Chapter 6, 7, 8, 9, and 10, to break the market size data at the country level, with revenue and market share for key countries in the world, from 2019 to 2024.and Metal Sputtering Target market forecast, by regions, by Type and by Application, with consumption value, from 2024 to 2030.

Chapter 11, market dynamics, drivers, restraints, trends, Porters Five Forces analysis.

Chapter 12, the key raw materials and key suppliers, and industry chain of Metal Sputtering Target.

Chapter 13, to describe Metal Sputtering Target research findings and conclusion.