Global High Purity Sputtering Target Material Market 2024 by Company, Regions, Type and Application, Forecast to 2030

Global High Purity Sputtering Target Material Market 2024 by Company, Regions, Type and Application, Forecast to 2030

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputter targets market.

In this report, we counted the high purity sputtering target material with 4N (purity≥99.99%）

According to our (Global Info Research) latest study, the global High Purity Sputtering Target Material market size was valued at US$ 2702 million in 2023 and is forecast to a readjusted size of USD 3110 million by 2030 with a CAGR of 2.1% during review period.

Global major companies profiled in the High Purity Sputtering Target Material market include Linde, Mitsui Mining & Smelting, JX Nippon Mining & Metals Corporation, Materion, Honeywell, Konfoong Materials International Co., Ltd, etc. Global top six companies account for nearly 60% of market share.

Asia-Pacific is the largest market, with a share about 85%, followed by North America, has a share about 9 percent.

In terms of product, Metal Sputtering Target Material is the largest segment, with a share over 60%. And in terms of application, the largest application is Semiconductor, followed by Flat Panel Display, Solar Energy, HDD, etc.

This report is a detailed and comprehensive analysis for global High Purity Sputtering Target Material market. Both quantitative and qualitative analyses are presented by company, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2024, are provided.

Key Features:

Global High Purity Sputtering Target Material market size and forecasts, in consumption value ($ Million), 2019-2030

Global High Purity Sputtering Target Material market size and forecasts by region and country, in consumption value ($ Million), 2019-2030

Global High Purity Sputtering Target Material market size and forecasts, by Type and by Application, in consumption value ($ Million), 2019-2030

Global High Purity Sputtering Target Material market shares of main players, in revenue ($ Million), 2019-2024

The Primary Objectives in This Report Are:

To determine the size of the total market opportunity of global and key countries

To assess the growth potential for High Purity Sputtering Target Material

To forecast future growth in each product and end-use market

To assess competitive factors affecting the marketplace

This report profiles key players in the global High Purity Sputtering Target Material market based on the following parameters - company overview, revenue, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Linde, Mitsui Mining & Smelting, JX Nippon Mining & Metals Corporation, Materion, Honeywell, Konfoong Materials International Co., Ltd, ULVAC, TOSOH, Luvata, Hitachi Metals, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Market segmentation

High Purity Sputtering Target Material market is split by Type and by Application. For the period 2019-2030, the growth among segments provides accurate calculations and forecasts for Consumption Value by Type and by Application. This analysis can help you expand your business by targeting qualified niche markets.

Market segmentation

High Purity Sputtering Target Material market is split by Type and by Application. For the period 2018-2029, the growth among segments provides accurate calculations and forecasts for Consumption Value by Type and by Application. This analysis can help you expand your business by targeting qualified niche markets.

Market segment by Type
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material

Market segment by Application
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others

Market segment by players, this report covers
Linde
Mitsui Mining & Smelting
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Konfoong Materials International Co., Ltd
ULVAC
TOSOH
Luvata
Hitachi Metals
LT Metal
Sumitomo Chemical
Plansee SE
Fujian Acetron New Materials Co., Ltd
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
Umicore
GRIKIN Advanced Material Co., Ltd.
Advantec
Angstrom Sciences

Market segment by regions, regional analysis covers

North America (United States, Canada and Mexico)

Europe (Germany, France, UK, Russia, Italy and Rest of Europe)

Asia-Pacific (China, Japan, South Korea, India, Southeast Asia and Rest of Asia-Pacific)

South America (Brazil, Rest of South America)

Middle East & Africa (Turkey, Saudi Arabia, UAE, Rest of Middle East & Africa)

The content of the study subjects, includes a total of 13 chapters:

Chapter 1, to describe High Purity Sputtering Target Material product scope, market overview, market estimation caveats and base year.

Chapter 2, to profile the top players of High Purity Sputtering Target Material, with revenue, gross margin, and global market share of High Purity Sputtering Target Material from 2019 to 2024.

Chapter 3, the High Purity Sputtering Target Material competitive situation, revenue, and global market share of top players are analyzed emphatically by landscape contrast.

Chapter 4 and 5, to segment the market size by Type and by Application, with consumption value and growth rate by Type, by Application, from 2019 to 2030.

Chapter 6, 7, 8, 9, and 10, to break the market size data at the country level, with revenue and market share for key countries in the world, from 2019 to 2024.and High Purity Sputtering Target Material market forecast, by regions, by Type and by Application, with consumption value, from 2024 to 2030.

Chapter 11, market dynamics, drivers, restraints, trends, Porters Five Forces analysis.

Chapter 12, the key raw materials and key suppliers, and industry chain of High Purity Sputtering Target Material.

Chapter 13, to describe High Purity Sputtering Target Material research findings and conclusion.