Global Deep UV KrF and ArF Photoresist Supply, Demand and Key Producers, 2023-2029

Global Deep UV KrF and ArF Photoresist Supply, Demand and Key Producers, 2023-2029

The global Deep UV KrF and ArF Photoresist market size is expected to reach $ million by 2029, rising at a market growth of % CAGR during the forecast period (2023-2029).

Deep UV KrF and ArF photoresists differ in terms of light source wavelength, resolution, line width, process application, etc. It is necessary to select the appropriate deep UV photoresist based on specific process requirements, cost, equipment compatibility and other factors. At the same time, the selection of photoresist must also consider compatibility with other process steps (such as masks and photolithography machines).

Deep UV KrF and ArF photoresists are key materials used in semiconductor manufacturing for deep UV lithography processes. KrF photoresist uses krypton fluoride laser as the light source, with a wavelength of 248 nanometers. KrF photoresist is suitable for relatively large process nodes, has high resolution and a long history of practical application. ArF photoresist uses an argon fluoride laser as a light source with a wavelength of 193 nanometers. ArF photoresist is suitable for smaller process nodes, with higher resolution and smaller line width capabilities.

This report studies the global Deep UV KrF and ArF Photoresist production, demand, key manufacturers, and key regions.

This report is a detailed and comprehensive analysis of the world market for Deep UV KrF and ArF Photoresist, and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2022 as the base year. This report explores demand trends and competition, as well as details the characteristics of Deep UV KrF and ArF Photoresist that contribute to its increasing demand across many markets.

Highlights and key features of the study

Global Deep UV KrF and ArF Photoresist total production and demand, 2018-2029, (Tons)

Global Deep UV KrF and ArF Photoresist total production value, 2018-2029, (USD Million)

Global Deep UV KrF and ArF Photoresist production by region & country, production, value, CAGR, 2018-2029, (USD Million) & (Tons)

Global Deep UV KrF and ArF Photoresist consumption by region & country, CAGR, 2018-2029 & (Tons)

U.S. VS China: Deep UV KrF and ArF Photoresist domestic production, consumption, key domestic manufacturers and share

Global Deep UV KrF and ArF Photoresist production by manufacturer, production, price, value and market share 2018-2023, (USD Million) & (Tons)

Global Deep UV KrF and ArF Photoresist production by Type, production, value, CAGR, 2018-2029, (USD Million) & (Tons)

Global Deep UV KrF and ArF Photoresist production by Application production, value, CAGR, 2018-2029, (USD Million) & (Tons).

This reports profiles key players in the global Deep UV KrF and ArF Photoresist market based on the following parameters – company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Tokyo Ohka Kogyo (TOK), JSR Micro, Fujifilm Holdings Corporation, Shin-Etsu Chemical, DuPont, Dongjin Semichem, Merck KGaA, Hitachi Chemical and Sumitomo Bakelite, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals, COVID-19 and Russia-Ukraine War Influence.

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Deep UV KrF and ArF Photoresist market.

Detailed Segmentation:

Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Tons) and average price (US$/Ton) by manufacturer, by Type, and by Application. Data is given for the years 2018-2029 by year with 2022 as the base year, 2023 as the estimate year, and 2024-2029 as the forecast year.

Global Deep UV KrF and ArF Photoresist Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World

Global Deep UV KrF and ArF Photoresist Market, Segmentation by Type
Positive Glue
Negative Glue

Global Deep UV KrF and ArF Photoresist Market, Segmentation by Application
Semiconductor Memory
Wafer Fabrication
Integrated Circuit Board
Others

Companies Profiled:
Tokyo Ohka Kogyo (TOK)
JSR Micro
Fujifilm Holdings Corporation
Shin-Etsu Chemical
DuPont
Dongjin Semichem
Merck KGaA
Hitachi Chemical
Sumitomo Bakelite
LG Chem
Everlight Electronics
Kolon Industries
Dow Chemical Company
HMT (Xiamen) New Material Technology
Jiangsu Nata Opto-electronic Material
Shanghai Sinyang Semiconductor Materials
Crystal Clear Electronic Material
Red Avenue New Materials
Shenzhen RongDa Photosensitive Science & Technology

Key Questions Answered

1. How big is the global Deep UV KrF and ArF Photoresist market?

2. What is the demand of the global Deep UV KrF and ArF Photoresist market?

3. What is the year over year growth of the global Deep UV KrF and ArF Photoresist market?

4. What is the production and production value of the global Deep UV KrF and ArF Photoresist market?

5. Who are the key producers in the global Deep UV KrF and ArF Photoresist market?