Global Deep UV KrF and ArF Photoresist Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029
According to our (Global Info Research) latest study, the global Deep UV KrF and ArF Photoresist market size was valued at USD million in 2022 and is forecast to a readjusted size of USD million by 2029 with a CAGR of % during review period.
Deep UV KrF and ArF photoresists are key materials used in semiconductor manufacturing for deep UV lithography processes. KrF photoresist uses krypton fluoride laser as the light source, with a wavelength of 248 nanometers. KrF photoresist is suitable for relatively large process nodes, has high resolution and a long history of practical application. ArF photoresist uses an argon fluoride laser as a light source with a wavelength of 193 nanometers. ArF photoresist is suitable for smaller process nodes, with higher resolution and smaller line width capabilities.
Deep UV KrF and ArF photoresists differ in terms of light source wavelength, resolution, line width, process application, etc. It is necessary to select the appropriate deep UV photoresist based on specific process requirements, cost, equipment compatibility and other factors. At the same time, the selection of photoresist must also consider compatibility with other process steps (such as masks and photolithography machines).
The Global Info Research report includes an overview of the development of the Deep UV KrF and ArF Photoresist industry chain, the market status of Semiconductor Memory (Positive Glue, Negative Glue), Wafer Fabrication (Positive Glue, Negative Glue), and key enterprises in developed and developing market, and analysed the cutting-edge technology, patent, hot applications and market trends of Deep UV KrF and ArF Photoresist.
Regionally, the report analyzes the Deep UV KrF and ArF Photoresist markets in key regions. North America and Europe are experiencing steady growth, driven by government initiatives and increasing consumer awareness. Asia-Pacific, particularly China, leads the global Deep UV KrF and ArF Photoresist market, with robust domestic demand, supportive policies, and a strong manufacturing base.
Key Features:
The report presents comprehensive understanding of the Deep UV KrF and ArF Photoresist market. It provides a holistic view of the industry, as well as detailed insights into individual components and stakeholders. The report analysis market dynamics, trends, challenges, and opportunities within the Deep UV KrF and ArF Photoresist industry.
The report involves analyzing the market at a macro level:
Market Sizing and Segmentation: Report collect data on the overall market size, including the sales quantity (Tons), revenue generated, and market share of different by Type (e.g., Positive Glue, Negative Glue).
Industry Analysis: Report analyse the broader industry trends, such as government policies and regulations, technological advancements, consumer preferences, and market dynamics. This analysis helps in understanding the key drivers and challenges influencing the Deep UV KrF and ArF Photoresist market.
Regional Analysis: The report involves examining the Deep UV KrF and ArF Photoresist market at a regional or national level. Report analyses regional factors such as government incentives, infrastructure development, economic conditions, and consumer behaviour to identify variations and opportunities within different markets.
Market Projections: Report covers the gathered data and analysis to make future projections and forecasts for the Deep UV KrF and ArF Photoresist market. This may include estimating market growth rates, predicting market demand, and identifying emerging trends.
The report also involves a more granular approach to Deep UV KrF and ArF Photoresist:
Company Analysis: Report covers individual Deep UV KrF and ArF Photoresist manufacturers, suppliers, and other relevant industry players. This analysis includes studying their financial performance, market positioning, product portfolios, partnerships, and strategies.
Consumer Analysis: Report covers data on consumer behaviour, preferences, and attitudes towards Deep UV KrF and ArF Photoresist This may involve surveys, interviews, and analysis of consumer reviews and feedback from different by Application (Semiconductor Memory, Wafer Fabrication).
Technology Analysis: Report covers specific technologies relevant to Deep UV KrF and ArF Photoresist. It assesses the current state, advancements, and potential future developments in Deep UV KrF and ArF Photoresist areas.
Competitive Landscape: By analyzing individual companies, suppliers, and consumers, the report present insights into the competitive landscape of the Deep UV KrF and ArF Photoresist market. This analysis helps understand market share, competitive advantages, and potential areas for differentiation among industry players.
Market Validation: The report involves validating findings and projections through primary research, such as surveys, interviews, and focus groups.
Market Segmentation
Deep UV KrF and ArF Photoresist market is split by Type and by Application. For the period 2018-2029, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value.
Market segment by Type
Positive Glue
Negative Glue
Market segment by Application
Semiconductor Memory
Wafer Fabrication
Integrated Circuit Board
Others
Major players covered
Tokyo Ohka Kogyo (TOK)
JSR Micro
Fujifilm Holdings Corporation
Shin-Etsu Chemical
DuPont
Dongjin Semichem
Merck KGaA
Hitachi Chemical
Sumitomo Bakelite
LG Chem
Everlight Electronics
Kolon Industries
Dow Chemical Company
HMT (Xiamen) New Material Technology
Jiangsu Nata Opto-electronic Material
Shanghai Sinyang Semiconductor Materials
Crystal Clear Electronic Material
Red Avenue New Materials
Shenzhen RongDa Photosensitive Science & Technology
Market segment by region, regional analysis covers
North America (United States, Canada and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Deep UV KrF and ArF Photoresist product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Deep UV KrF and ArF Photoresist, with price, sales, revenue and global market share of Deep UV KrF and ArF Photoresist from 2018 to 2023.
Chapter 3, the Deep UV KrF and ArF Photoresist competitive situation, sales quantity, revenue and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Deep UV KrF and ArF Photoresist breakdown data are shown at the regional level, to show the sales quantity, consumption value and growth by regions, from 2018 to 2029.
Chapter 5 and 6, to segment the sales by Type and application, with sales market share and growth rate by type, application, from 2018 to 2029.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value and market share for key countries in the world, from 2017 to 2022.and Deep UV KrF and ArF Photoresist market forecast, by regions, type and application, with sales and revenue, from 2024 to 2029.
Chapter 12, market dynamics, drivers, restraints, trends and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Deep UV KrF and ArF Photoresist.
Chapter 14 and 15, to describe Deep UV KrF and ArF Photoresist sales channel, distributors, customers, research findings and conclusion.