Global Deep Reactive Ion Etch Equipment Market 2025 by Manufacturers, Regions, Type and Application, Forecast to 2031

According to our (Global Info Research) latest study, the global Deep Reactive Ion Etch Equipment market size was valued at US$ million in 2024 and is forecast to a readjusted size of USD million by 2031 with a CAGR of %during review period.

The global Semiconductor Etch Equipment revenue was US$ 22730 million in 2022 and is forecast to a readjusted size of US$ 49330 million by 2029 with a CAGR of 11.2% during the forecast period (2023-2029).

Global key players of semiconductor etch equipment include Lam Research, TEL, Applied Materials, Hitachi High-Tech and AMEC. The top three players of semiconductor etch equipment account for approximately 90% of the total market. North America is the largest producer, holds a share around 60%, followed by Japan and Europe, with share 35% and 3%, separately.

This report is a detailed and comprehensive analysis for global Deep Reactive Ion Etch Equipment market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.

Key Features:

Global Deep Reactive Ion Etch Equipment market size and forecasts, in consumption value ($ Million), sales quantity (Unit), and average selling prices (US$/Unit), 2020-2031

Global Deep Reactive Ion Etch Equipment market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Unit), and average selling prices (US$/Unit), 2020-2031

Global Deep Reactive Ion Etch Equipment market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Unit), and average selling prices (US$/Unit), 2020-2031

Global Deep Reactive Ion Etch Equipment market shares of main players, shipments in revenue ($ Million), sales quantity (Unit), and ASP (US$/Unit), 2020-2025

The Primary Objectives in This Report Are:

To determine the size of the total market opportunity of global and key countries

To assess the growth potential for Deep Reactive Ion Etch Equipment

To forecast future growth in each product and end-use market

To assess competitive factors affecting the marketplace

This report profiles key players in the global Deep Reactive Ion Etch Equipment market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Lam Research, Akrion, ULVAC, CORIAL, TEL, Applied Materials, Hitachi High-Technologies, Oxford Instruments, SPTS Technologies, Plasma-Therm, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Market Segmentation

Deep Reactive Ion Etch Equipment market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.

Market segment by Type
Inductively Coupled Plasma (ICP)
Capacitive Coupled Plasma (CCP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others

Market segment by Application
MEMS
Advanced Packaging
Power Devices
Medical
Others

Major players covered
Lam Research
Akrion
ULVAC
CORIAL
TEL
Applied Materials
Hitachi High-Technologies
Oxford Instruments
SPTS Technologies
Plasma-Therm
GigaLane
SAMCO
AMEC
NANO-MASTER
Sumitomo Precision Products

Market segment by region, regional analysis covers

North America (United States, Canada, and Mexico)

Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)

Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)

South America (Brazil, Argentina, Colombia, and Rest of South America)

Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)

The content of the study subjects, includes a total of 15 chapters:

Chapter 1, to describe Deep Reactive Ion Etch Equipment product scope, market overview, market estimation caveats and base year.

Chapter 2, to profile the top manufacturers of Deep Reactive Ion Etch Equipment, with price, sales quantity, revenue, and global market share of Deep Reactive Ion Etch Equipment from 2020 to 2025.

Chapter 3, the Deep Reactive Ion Etch Equipment competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.

Chapter 4, the Deep Reactive Ion Etch Equipment breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.

Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.

Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Deep Reactive Ion Etch Equipment market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.

Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.

Chapter 13, the key raw materials and key suppliers, and industry chain of Deep Reactive Ion Etch Equipment.

Chapter 14 and 15, to describe Deep Reactive Ion Etch Equipment sales channel, distributors, customers, research findings and conclusion.