Global DUV and EUV Photoresist Supply, Demand and Key Producers, 2023-2029

Global DUV and EUV Photoresist Supply, Demand and Key Producers, 2023-2029


The global DUV and EUV Photoresist market size is expected to reach $ million by 2029, rising at a market growth of % CAGR during the forecast period (2023-2029).

DUV photoresists use longer wavelengths of ultraviolet light, and EUV photoresists use shorter wavelengths of extreme ultraviolet light. Photoresist is an important part of the photolithography process and is closely related to equipment such as photolithography machines, masks, and other process steps. In practical applications, selecting the appropriate photoresist requires taking into account specific process requirements, manufacturing costs, equipment compatibility and other factors.

DUV and EUV photoresists are key materials used in semiconductor manufacturing and function as photoresists under different wavelength conditions. DUV photoresist is mainly used in deep ultraviolet lithography process. Its light source is usually neon fluoride laser or halogen lamp, which has high resolution and long practical application history. EUV photoresist is mainly used in the extreme ultraviolet lithography process, and its light source is a laser plasma light source of extreme ultraviolet light (wavelength 13.5 nanometers). EUV photoresist has shorter wavelengths and higher energies, enabling smaller linewidths and higher resolutions.

This report studies the global DUV and EUV Photoresist production, demand, key manufacturers, and key regions.

This report is a detailed and comprehensive analysis of the world market for DUV and EUV Photoresist, and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2022 as the base year. This report explores demand trends and competition, as well as details the characteristics of DUV and EUV Photoresist that contribute to its increasing demand across many markets.

Highlights and key features of the study

Global DUV and EUV Photoresist total production and demand, 2018-2029, (Tons)

Global DUV and EUV Photoresist total production value, 2018-2029, (USD Million)

Global DUV and EUV Photoresist production by region & country, production, value, CAGR, 2018-2029, (USD Million) & (Tons)

Global DUV and EUV Photoresist consumption by region & country, CAGR, 2018-2029 & (Tons)

U.S. VS China: DUV and EUV Photoresist domestic production, consumption, key domestic manufacturers and share

Global DUV and EUV Photoresist production by manufacturer, production, price, value and market share 2018-2023, (USD Million) & (Tons)

Global DUV and EUV Photoresist production by Type, production, value, CAGR, 2018-2029, (USD Million) & (Tons)

Global DUV and EUV Photoresist production by Application production, value, CAGR, 2018-2029, (USD Million) & (Tons).

This reports profiles key players in the global DUV and EUV Photoresist market based on the following parameters – company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Tokyo Ohka Kogyo (TOK), JSR Micro, Fujifilm Holdings Corporation, Shin-Etsu Chemical, DuPont, Dongjin Semichem, Merck KGaA, Hitachi Chemical and Sumitomo Bakelite, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals, COVID-19 and Russia-Ukraine War Influence.

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World DUV and EUV Photoresist market.

Detailed Segmentation:

Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Tons) and average price (US$/Ton) by manufacturer, by Type, and by Application. Data is given for the years 2018-2029 by year with 2022 as the base year, 2023 as the estimate year, and 2024-2029 as the forecast year.

Global DUV and EUV Photoresist Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World

Global DUV and EUV Photoresist Market, Segmentation by Type
13.5nm
193nm
248nm

Global DUV and EUV Photoresist Market, Segmentation by Application
Semiconductor Lithography
Wafer Fabrication
Integrated Circuit Board
Others

Companies Profiled:
Tokyo Ohka Kogyo (TOK)
JSR Micro
Fujifilm Holdings Corporation
Shin-Etsu Chemical
DuPont
Dongjin Semichem
Merck KGaA
Hitachi Chemical
Sumitomo Bakelite
LG Chem
Everlight Electronics
Kolon Industries
Dow Chemical Company
HMT (Xiamen) New Material Technology
Jiangsu Nata Opto-electronic Material
Shanghai Sinyang Semiconductor Materials
Crystal Clear Electronic Material
Red Avenue New Materials
Shenzhen RongDa Photosensitive Science & Technology

Key Questions Answered

1. How big is the global DUV and EUV Photoresist market?

2. What is the demand of the global DUV and EUV Photoresist market?

3. What is the year over year growth of the global DUV and EUV Photoresist market?

4. What is the production and production value of the global DUV and EUV Photoresist market?

5. Who are the key producers in the global DUV and EUV Photoresist market?


1 Supply Summary
2 Demand Summary
3 World Manufacturers Competitive Analysis
4 United States VS China VS Rest of the World
5 Market Analysis by Type
6 Market Analysis by Application
7 Company Profiles
8 Industry Chain Analysis
9 Research Findings and Conclusion
10 Appendix

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