Global ArF Photoresist Monomer Supply, Demand and Key Producers, 2024-2030

Global ArF Photoresist Monomer Supply, Demand and Key Producers, 2024-2030


The global ArF Photoresist Monomer market size is expected to reach $ 735.1 million by 2030, rising at a market growth of 7.8% CAGR during the forecast period (2024-2030).

According to the SEMI report, the semiconductor materials market will grow by 8.6% in 2022, hitting a new high of US$69.8 billion in market size. Since semiconductor materials are an industry with high technical barriers, most high-end products of semiconductor materials are currently concentrated in the United States, Japan, Germany and other countries and regions. From a demand perspective, Taiwan, China, South Korea, Japan, and the United States are the world's largest semiconductor material markets, accounting for more than 80% of the global market. With the shift of the semiconductor industry, the global semiconductor materials industry has also experienced a shift of center of gravity from west to east. China's semiconductor materials market is the fastest growing region in the world. In 2022, the United States will introduce new regulations to sanction China's advanced semiconductor process industry. This will have a certain impact on all aspects of China's integrated circuit manufacturing industry in the short term. However, in the long term, China's integrated circuit industry will inevitably will embark on the road of independent innovation.

ArF photoresist monomer is the basic component of photoresist. Through the action of photosensitizer, it polymerizes into macromolecules under ultraviolet light irradiation to form the structure of photoresist. Specifically, the types of different photorettic glue have corresponding photoresistic glue monomers. For ARF lithography, its monomers mainly include methyl acrylate and derivatives of acrylic. Under the influence of photochemical agents, polymerization reactions will occur under ultraviolet light, forming a polymer with large molecular weight. These polymers have good light sensitivity and film formability. Material.

This report studies the global ArF Photoresist Monomer production, demand, key manufacturers, and key regions.

This report is a detailed and comprehensive analysis of the world market for ArF Photoresist Monomer, and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2023 as the base year. This report explores demand trends and competition, as well as details the characteristics of ArF Photoresist Monomer that contribute to its increasing demand across many markets.

Highlights and key features of the study

Global ArF Photoresist Monomer total production and demand, 2019-2030, (Tons)

Global ArF Photoresist Monomer total production value, 2019-2030, (USD Million)

Global ArF Photoresist Monomer production by region & country, production, value, CAGR, 2019-2030, (USD Million) & (Tons)

Global ArF Photoresist Monomer consumption by region & country, CAGR, 2019-2030 & (Tons)

U.S. VS China: ArF Photoresist Monomer domestic production, consumption, key domestic manufacturers and share

Global ArF Photoresist Monomer production by manufacturer, production, price, value and market share 2019-2024, (USD Million) & (Tons)

Global ArF Photoresist Monomer production by Type, production, value, CAGR, 2019-2030, (USD Million) & (Tons)

Global ArF Photoresist Monomer production by Application production, value, CAGR, 2019-2030, (USD Million) & (Tons).

This reports profiles key players in the global ArF Photoresist Monomer market based on the following parameters – company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include The Dow Chemicals, Songwon, ENF, Sartomer, Nippon Soda, Idemitsu Kosan, Marubeni Corporation, Mitsubishi Chemical and Jiuri New Materials, etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World ArF Photoresist Monomer market.

Detailed Segmentation:

Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Tons) and average price (US$/Ton) by manufacturer, by Type, and by Application. Data is given for the years 2019-2030 by year with 2023 as the base year, 2024 as the estimate year, and 2025-2030 as the forecast year.

Global ArF Photoresist Monomer Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World

Global ArF Photoresist Monomer Market, Segmentation by Type
Acrylic
Epoxy
Aromatic Ethers

Global ArF Photoresist Monomer Market, Segmentation by Application
Positive Photoresist
Negative Photoresist

Companies Profiled:
The Dow Chemicals
Songwon
ENF
Sartomer
Nippon Soda
Idemitsu Kosan
Marubeni Corporation
Mitsubishi Chemical
Jiuri New Materials
Hmt (Xiamen) New Technical Materials Co., Ltd.

Key Questions Answered

1. How big is the global ArF Photoresist Monomer market?

2. What is the demand of the global ArF Photoresist Monomer market?

3. What is the year over year growth of the global ArF Photoresist Monomer market?

4. What is the production and production value of the global ArF Photoresist Monomer market?

5. Who are the key producers in the global ArF Photoresist Monomer market?


1 Supply Summary
2 Demand Summary
3 World Manufacturers Competitive Analysis
4 United States VS China VS Rest of the World
5 Market Analysis by Type
6 Market Analysis by Application
7 Company Profiles
8 Industry Chain Analysis
9 Research Findings and Conclusion
10 Appendix

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