Focused Ion Beam

Focused Ion Beam

Global Focused Ion Beam Market to Reach US$1.9 Billion by 2030

The global market for Focused Ion Beam estimated at US$1.1 Billion in the year 2023, is expected to reach US$1.9 Billion by 2030, growing at a CAGR of 8.5% over the analysis period 2023-2030. Ga+ Liquid Metal-Sourced Focused Ion Beam, one of the segments analyzed in the report, is expected to record a 9.2% CAGR and reach US$1.2 Billion by the end of the analysis period. Growth in the Gas Field-Sourced Focused Ion Beam segment is estimated at 6.6% CAGR over the analysis period.

The U.S. Market is Estimated at US$349.6 Million While China is Forecast to Grow at 10.4% CAGR

The Focused Ion Beam market in the U.S. is estimated at US$349.6 Million in the year 2023. China, the world`s second largest economy, is forecast to reach a projected market size of US$269.7 Million by the year 2030 trailing a CAGR of 10.4% over the analysis period 2023-2030. Among the other noteworthy geographic markets are Japan and Canada, each forecast to grow at a CAGR of 7.0% and 7.6% respectively over the analysis period. Within Europe, Germany is forecast to grow at approximately 8.9% CAGR.

Global Focused Ion Beam Market - Key Trends and Drivers Summarized

Focused ion beam, or FIB, refers to a technique that is used primarily in the semiconductor industry as well as the in the fields of materials science and biology for the purpose of site specifically analyzing, imaging, depositing, milling, machining, manipulating, and ablating materials. Focused Ion Beam (FIB) systems are highly sophisticated tools used primarily for material processing and analysis at the micro and nano scales. This technology operates by directing a focused beam of ions (commonly gallium ions) onto a sample surface, which can be used to mill the surface (remove material), deposit material, or even for imaging. The versatility of FIB makes it indispensable in fields like materials science, electronics, and nanotechnology, where such precise manipulation and examination of materials are required. In comparison to electron microscopy, FIB allows not only for imaging but also enables the modification of the sample by either sputtering away material or depositing selected materials via ion-beam-induced deposition.

FIB is used for defect analysis, failure analysis, and the reverse engineering of components, providing vital insights that can drive the development of more efficient and higher-performing materials and devices. The application of focused ion beam techniques in in the study of biomaterials and biological matter has progressed consistently owing to its ability to integrate complementary tools like dual-beam scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), or environmental SEM. In recent years, the capability of FIB systems has expanded, including dual-beam systems that combine a FIB with an electron beam, enhancing their utility by allowing simultaneous sputtering and imaging. This combination is particularly valuable for in situ process monitoring and analysis, enabling researchers and manufacturers to observe and modify materials at the atomic scale in real-time. Additionally, FIB is used in the fabrication of prototypes of nanoscale devices, including sensors and transistors, which are critical in the advancement of electronics and nanotechnology.

The growth in the Focused Ion Beam market is driven by several factors, including the increasing demand for nanotechnology, the miniaturization of electronic devices, and advancements in FIB technology itself. As electronic devices continue to shrink in size, the need for precise and efficient fabrication and modification tools becomes crucial. FIB systems provide the resolution and control necessary for creating and modifying materials at the nanoscale, aligning well with industry trends towards greater miniaturization. Technological advancements that increase the speed, accuracy, and types of materials that can be processed by FIBs also extend their application range, making them appealing for a broader spectrum of scientific research and industrial applications. Furthermore, the growing investment in R&D by sectors such as electronics, automotive, and aerospace, where materials engineering and failure analysis are crucial, continuously drives the demand for advanced FIB systems.

Select Competitors (Total 36 Featured) -

• Hitachi Ltd.
• Seiko Instruments, Inc. (SII)
• Eurofins Scientific SE
• Sandia National Laboratories
• Ionpath Inc.
• EAG Laboratories
• Hitachi High-Tech Corporation
• Nano-Master, Inc.
• Seiko Holdings Corporation
• Kratos Analytical Ltd.
• Raith GmbH
• Quantum Design GmbH
• Helmholtz-Zentrum Dresden - Rossendorf e. V.
• Particle Beam Systems & Technology (PBST)
• Elionix Inc.

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