Global Sputtering Targets and Sputtered Films Competitive Landscape Professional Research Report 2025
Research SummarySputtering targets and sputtered films are integral components and products of the sputtering process used in thin film deposition technologies. Sputtering targets are solid materials made from high-purity metals, alloys, oxides, or other compounds, designed to be the source of material for deposition onto substrates. During sputtering, the target material is bombarded with ions from a plasma (typically argon ions), causing atoms or molecules to be ejected from the target surface. These ejected particles travel in a straight line and deposit onto a substrate placed in the vacuum chamber, forming a thin film. This process allows for precise control over the thickness, composition, and properties of the deposited film, which are crucial for various industrial applications. Sputtered films, on the other hand, refer to the thin layers of material deposited onto substrates through sputtering. These films can exhibit diverse characteristics such as optical transparency, electrical conductivity, magnetic properties, corrosion resistance, and more, depending on the specific material and application requirements. Sputtering targets and sputtered films play critical roles in semiconductor manufacturing, optical coatings, magnetic storage media, and other advanced technologies where thin film deposition is essential for device performance and functionality. Regular advancements in target materials and sputtering techniques continue to drive innovation across these industries, enabling the development of increasingly sophisticated electronic and optical devices.
According to DIResearch's in-depth investigation and research, the global Sputtering Targets and Sputtered Films market size was valued at XX Million USD in 2024 and is projected to reach XX Million USD by 2032, with a CAGR of XX% (2025-2032). Notably, the China market has changed rapidly in the past few years. By 2024, China's market size is expected to be XX Million USD, representing approximately XX% of the global market share. By 2032, it is anticipated to grow further to XX Million USD, contributing XX% to the worldwide market share.
The major global manufacturers of Sputtering Targets and Sputtered Films include JX Nippon Mining & Metals Corporation, Materion, Praxair (Linde), Mitsui Mining & Smelting, Plansee SE, Konfoong Materials International Co., Ltd, Sumitomo Chemical, Hitachi Metals, ULVAC, TOSOH, GRIKIN Advanced Material Co., Ltd., LT Metal, Honeywell, Fujian Acetron New Materials Co., Ltd, TANAKA, Luvata, Longhua Technology Group (Luoyang) Co., Ltd., Umicore Thin Film Products, Changzhou Sujing Electronic Material, FURUYA Metals Co., Ltd, Advantec etc. The global players competition landscape in this report is divided into three tiers. The first tier comprises global leading enterprises that command a substantial market share, hold a dominant industry position, possess strong competitiveness and influence, and generate significant revenue. The second tier includes companies with a notable market presence and reputation; these firms actively follow industry leaders in product, service, or technological innovation and maintain a moderate revenue scale. The third tier consists of smaller companies with limited market share and lower brand recognition, primarily focused on local markets and generating comparatively lower revenue.
This report studies the market size, price trends and future development prospects of Sputtering Targets and Sputtered Films. Focus on analysing the market share, product portfolio, prices, sales, revenue and gross profit margin of global major manufacturers, as well as the market status and trends of different product types and applications in the global Sputtering Targets and Sputtered Films market. The report data covers historical data from 2020 to 2024, based year in 2025 and forecast data from 2026 to 2032.
The regions and countries in the report include North America, Europe, China, APAC (excl. China), Latin America and Middle East and Africa, covering the Sputtering Targets and Sputtered Films market conditions and future development trends of key regions and countries, combined with industry-related policies and the latest technological developments, analyze the development characteristics of Sputtering Targets and Sputtered Films industries in various regions and countries, help companies understand the development characteristics of each region, help companies formulate business strategies, and achieve the ultimate goal of the company's global development strategy.
The data sources of this report mainly include the National Bureau of Statistics, customs databases, industry associations, corporate financial reports, third-party databases, etc. Among them, macroeconomic data mainly comes from the National Bureau of Statistics, International Economic Research Organization; industry statistical data mainly come from industry associations; company data mainly comes from interviews, public information collection, third-party reliable databases, and price data mainly comes from various markets monitoring database.
Global Key Manufacturers of Sputtering Targets and Sputtered Films Include:
JX Nippon Mining & Metals Corporation
Materion
Praxair (Linde)
Mitsui Mining & Smelting
Plansee SE
Konfoong Materials International Co., Ltd
Sumitomo Chemical
Hitachi Metals
ULVAC
TOSOH
GRIKIN Advanced Material Co., Ltd.
LT Metal
Honeywell
Fujian Acetron New Materials Co., Ltd
TANAKA
Luvata
Longhua Technology Group (Luoyang) Co., Ltd.
Umicore Thin Film Products
Changzhou Sujing Electronic Material
FURUYA Metals Co., Ltd
Advantec
Sputtering Targets and Sputtered Films Product Segment Include:
Sputtering Targets
Sputtered Films
Sputtering Targets and Sputtered Films Product Application Include:
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others
Chapter ScopeChapter 1: Product Research Range, Product Types and Applications, Market Overview, Market Situation and Trends
Chapter 2: Global Sputtering Targets and Sputtered Films Industry PESTEL Analysis
Chapter 3: Global Sputtering Targets and Sputtered Films Industry Porter's Five Forces Analysis
Chapter 4: Global Sputtering Targets and Sputtered Films Major Regional Market Size and Forecast Analysis
Chapter 5: Global Sputtering Targets and Sputtered Films Market Size and Forecast by Type and Application Analysis
Chapter 6: North America Passenger Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)
Chapter 7: Europe Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)
Chapter 8: China Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)
Chapter 9: APAC (Excl. China) Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)
Chapter 10: Latin America Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)
Chapter 11: Middle East and Africa Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)
Chapter 12: Global Sputtering Targets and Sputtered Films Competitive Analysis of Key Manufacturers (Revenue, Market Share, Regional Distribution and Industry Concentration)
Chapter 13: Key Company Profiles (Product Portfolio, Revenue and Gross Margin)
Chapter 14: Industrial Chain Analysis, Include Raw Material Suppliers, Distributors and Customers
Chapter 15: Research Findings and Conclusion
Chapter 16: Methodology and Data Sources