Global Sputtering Targets and Sputtered Films Competitive Landscape Professional Research Report 2024

Global Sputtering Targets and Sputtered Films Competitive Landscape Professional Research Report 2024

Research Summary

Sputtering targets and sputtered films are integral components and products of the sputtering process used in thin film deposition technologies. Sputtering targets are solid materials made from high-purity metals, alloys, oxides, or other compounds, designed to be the source of material for deposition onto substrates. During sputtering, the target material is bombarded with ions from a plasma (typically argon ions), causing atoms or molecules to be ejected from the target surface. These ejected particles travel in a straight line and deposit onto a substrate placed in the vacuum chamber, forming a thin film. This process allows for precise control over the thickness, composition, and properties of the deposited film, which are crucial for various industrial applications. Sputtered films, on the other hand, refer to the thin layers of material deposited onto substrates through sputtering. These films can exhibit diverse characteristics such as optical transparency, electrical conductivity, magnetic properties, corrosion resistance, and more, depending on the specific material and application requirements. Sputtering targets and sputtered films play critical roles in semiconductor manufacturing, optical coatings, magnetic storage media, and other advanced technologies where thin film deposition is essential for device performance and functionality. Regular advancements in target materials and sputtering techniques continue to drive innovation across these industries, enabling the development of increasingly sophisticated electronic and optical devices.

According to DIResearch's in-depth investigation and research, the global Sputtering Targets and Sputtered Films market size will reach XX US$ Million in 2024, and is expected to reach XX US$ Million in 2030, with a CAGR of XX% (2025-2030). Among them, the China market has changed rapidly in the past few years. The market size in 2024 will be XX US$ Million, accounting for approximately XX% of the world. It is expected to reach XX US$ Million in 2030, and the global share will reach XX%.

The major global manufacturers of Sputtering Targets and Sputtered Films include JX Nippon Mining & Metals Corporation, Materion, Praxair (Linde), Mitsui Mining & Smelting, Plansee SE, Konfoong Materials International Co., Ltd, Sumitomo Chemical, Hitachi Metals, ULVAC, TOSOH, GRIKIN Advanced Material Co., Ltd., LT Metal, Honeywell, Fujian Acetron New Materials Co., Ltd, TANAKA, Luvata, Longhua Technology Group (Luoyang) Co., Ltd., Umicore Thin Film Products, Changzhou Sujing Electronic Material, FURUYA Metals Co., Ltd, Advantec etc. The global players competition landscape in this report is divided into three tiers. The first tiers is the global leading enterprise, which occupies a major market share, is in a leading position in the industry, has strong competitiveness and influence, and has a large revenue scale; the second tiers has a certain share and popularity in the market, actively follows the industry leaders in product, service or technological innovation, and has a medium revenue scale; the third tiers has a smaller share in the market, has a lower brand awareness, mainly focuses on the local market, and has a relatively small revenue scale.

This report studies the market size, price trends and future development prospects of Sputtering Targets and Sputtered Films. Focus on analysing the market share, product portfolio, revenue and gross profit margin of global major manufacturers, as well as the market status and trends of different product types and applications in the global Sputtering Targets and Sputtered Films market. The report data covers historical data from 2019 to 2023, base year in 2024 and forecast data from 2025 to 2030.

The regions and countries in the report include North America, Europe, China, APAC (excl. China), Latin America and Middle East and Africa, covering the Sputtering Targets and Sputtered Films market conditions and future development trends of key regions and countries, combined with industry-related policies and the latest technological developments, analyze the development characteristics of Sputtering Targets and Sputtered Films industries in various regions and countries, help companies understand the development characteristics of each region, help companies formulate business strategies, and achieve the ultimate goal of the company's global development strategy.

The data sources of this report mainly include the National Bureau of Statistics, customs databases, industry associations, corporate financial reports, third-party databases, etc. Among them, macroeconomic data mainly comes from the National Bureau of Statistics, International Economic Research Organization; industry statistical data mainly come from industry associations; company data mainly comes from interviews, public information collection, third-party reliable databases, and price data mainly comes from various markets monitoring database.

Global Key Manufacturers of Sputtering Targets and Sputtered Films Include:

JX Nippon Mining & Metals Corporation

Materion

Praxair (Linde)

Mitsui Mining & Smelting

Plansee SE

Konfoong Materials International Co., Ltd

Sumitomo Chemical

Hitachi Metals

ULVAC

TOSOH

GRIKIN Advanced Material Co., Ltd.

LT Metal

Honeywell

Fujian Acetron New Materials Co., Ltd

TANAKA

Luvata

Longhua Technology Group (Luoyang) Co., Ltd.

Umicore Thin Film Products

Changzhou Sujing Electronic Material

FURUYA Metals Co., Ltd

Advantec

Sputtering Targets and Sputtered Films Product Segment Include:

Sputtering Targets

Sputtered Films

Sputtering Targets and Sputtered Films Product Application Include:

Semiconductor

Solar Energy

Flat Panel Display

HDD

Others

Chapter Scope

Chapter 1: Product Research Range, Product Types and Applications, Market Overview, Market Situation and Trends

Chapter 2: Global Sputtering Targets and Sputtered Films Industry PESTEL Analysis

Chapter 3: Global Sputtering Targets and Sputtered Films Industry Porter’s Five Forces Analysis

Chapter 4: Global Sputtering Targets and Sputtered Films Major Regional Market Size and Forecast Analysis

Chapter 5: Global Sputtering Targets and Sputtered Films Market Size and Forecast by Type and Application Analysis

Chapter 6: North America Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 7: Europe Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 8: China Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 9: APAC (Excl. China) Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 10: Latin America Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 11: Middle East and Africa Sputtering Targets and Sputtered Films Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 12: Global Sputtering Targets and Sputtered Films Competitive Analysis of Key Manufacturers (Revenue, Market Share, Regional Distribution and Industry Concentration)

Chapter 13: Key Company Profiles (Product Portfolio, Revenue and Gross Margin)

Chapter 14: Industrial Chain Analysis, Include Raw Material Suppliers, Distributors and Customers

Chapter 15: Research Findings and Conclusion

Chapter 16: Methodology and Data Sources