Global Inductively Coupled Plasma (ICP) Etchers Competitive Landscape Professional Research Report 2025

Research Summary

Inductively Coupled Plasma (ICP) etchers are sophisticated plasma processing tools used in semiconductor manufacturing for precise etching of materials on semiconductor wafers. These systems utilize inductively coupled plasma, generated within a vacuum chamber, to remove material from the wafer surface with high selectivity and uniformity. In ICP etchers, radiofrequency (RF) power is used to create a plasma from a gas, typically a mixture of gases like chlorine (Cl2), sulfur hexafluoride (SF6), or oxygen (O2). The plasma is then directed onto the wafer surface, where it chemically reacts with the material to be etched. The inductively coupled plasma enhances the etching process by providing high-density plasma with a low ion energy, resulting in highly anisotropic etching profiles and minimal damage to the underlying layers. ICP etchers are used in the fabrication of advanced semiconductor devices, including integrated circuits (ICs), memory devices, and microelectromechanical systems (MEMS), where precise etching control is essential for device performance and yield.

According to DIResearch's in-depth investigation and research, the global Inductively Coupled Plasma (ICP) Etchers market size was valued at XX Million USD in 2024 and is projected to reach XX Million USD by 2032, with a CAGR of XX% (2025-2032). Notably, the China market has changed rapidly in the past few years. By 2024, China's market size is expected to be XX Million USD, representing approximately XX% of the global market share. By 2032, it is anticipated to grow further to XX Million USD, contributing XX% to the worldwide market share.

The major global  manufacturers of Inductively Coupled Plasma (ICP) Etchers include Lam Research, TEL, Applied Materials, Hitachi High-Tech, Oxford Instruments, SPTS Technologies, Plasma-Therm, GigaLane, SAMCO, Corial, AMEC, NAURA etc. The global players competition landscape in this report is divided into three tiers. The first tier comprises global leading enterprises that command a substantial market share, hold a dominant industry position, possess strong competitiveness and influence, and generate significant revenue. The second tier includes companies with a notable market presence and reputation; these firms actively follow industry leaders in product, service, or technological innovation and maintain a moderate revenue scale. The third tier consists of smaller companies with limited market share and lower brand recognition, primarily focused on local markets and generating comparatively lower revenue.

This report studies the market size, price trends and future development prospects of Inductively Coupled Plasma (ICP) Etchers. Focus on analysing the market share, product portfolio, prices, sales, revenue and gross profit margin of global major manufacturers, as well as the market status and trends of different product types and applications in the global Inductively Coupled Plasma (ICP) Etchers market. The report data covers historical data from 2020 to 2024, based year in 2025 and forecast data from 2026 to 2032.

The regions and countries in the report include North America, Europe, China, APAC (excl. China), Latin America and Middle East and Africa, covering the Inductively Coupled Plasma (ICP) Etchers market conditions and future development trends of key regions and countries, combined with industry-related policies and the latest technological developments, analyze the development characteristics of Inductively Coupled Plasma (ICP) Etchers industries in various regions and countries, help companies understand the development characteristics of each region, help companies formulate business strategies, and achieve the ultimate goal of the company's global development strategy.  

The data sources of this report mainly include the National Bureau of Statistics, customs databases, industry associations, corporate financial reports, third-party databases, etc. Among them, macroeconomic data mainly comes from the National Bureau of Statistics, International Economic Research Organization; industry statistical data mainly come from industry associations; company data mainly comes from interviews, public information collection, third-party reliable databases, and price data mainly comes from various markets monitoring database.

Global Key Manufacturers of Inductively Coupled Plasma (ICP) Etchers Include:

Lam Research

TEL

Applied Materials

Hitachi High-Tech

Oxford Instruments

SPTS Technologies

Plasma-Therm

GigaLane

SAMCO

Corial

AMEC

NAURA

Inductively Coupled Plasma (ICP) Etchers Product Segment Include:

Planar ICP Source

Cylindrical ICP Source

Inductively Coupled Plasma (ICP) Etchers Product Application Include:

Semiconductors

Dielectrics

Metals

Polymers

Chapter Scope

Chapter 1: Product Research Range, Product Types and Applications, Market Overview, Market Situation and Trends

Chapter 2: Global Inductively Coupled Plasma (ICP) Etchers Industry PESTEL Analysis

Chapter 3: Global Inductively Coupled Plasma (ICP) Etchers Industry Porter’s Five Forces Analysis

Chapter 4: Global Inductively Coupled Plasma (ICP) Etchers Major Regional Market Size (Revenue, Sales, Price) and Forecast Analysis

Chapter 5: Global Inductively Coupled Plasma (ICP) Etchers Market Size and Forecast by Type and Application Analysis

Chapter 6: North America Inductively Coupled Plasma (ICP) Etchers Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 7: Europe Inductively Coupled Plasma (ICP) Etchers Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 8: China Inductively Coupled Plasma (ICP) Etchers Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 9: APAC (Excl. China) Inductively Coupled Plasma (ICP) Etchers Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 10: Latin America Inductively Coupled Plasma (ICP) Etchers Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 11: Middle East and Africa Inductively Coupled Plasma (ICP) Etchers Competitive Analysis (Market Size, Key Players and Market Share, Product Type and Application Segment Analysis, Countries Analysis)

Chapter 12: Global Inductively Coupled Plasma (ICP) Etchers Competitive Analysis of Key Manufacturers (Sales, Revenue, Market Share, Price, Regional Distribution and Industry Concentration)

Chapter 13: Key Company Profiles (Product Portfolio, Sales, Revenue, Price and Gross Margin)

Chapter 14: Industrial Chain Analysis, Include Raw Material Suppliers, Distributors and Customers

Chapter 15: Research Findings and Conclusion

Chapter 16: Methodology and Data Sources