Global Semiconductor Used High Purity Sputtering Target Material Market Research Report 2024(Status and Outlook)

Global Semiconductor Used High Purity Sputtering Target Material Market Research Report 2024(Status and Outlook)



Report Overview:

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. In this report, we counted the semiconductor use high purity sputtering target material with 4N (purity≥99.99%).

The Global Semiconductor Used High Purity Sputtering Target Material Market Size was estimated at USD 1893.98 million in 2023 and is projected to reach USD 2209.33 million by 2029, exhibiting a CAGR of 2.60% during the forecast period.

This report provides a deep insight into the global Semiconductor Used High Purity Sputtering Target Material market covering all its essential aspects. This ranges from a macro overview of the market to micro details of the market size, competitive landscape, development trend, niche market, key market drivers and challenges, SWOT analysis, Porter’s five forces analysis, value chain analysis, etc.

The analysis helps the reader to shape the competition within the industries and strategies for the competitive environment to enhance the potential profit. Furthermore, it provides a simple framework for evaluating and accessing the position of the business organization. The report structure also focuses on the competitive landscape of the Global Semiconductor Used High Purity Sputtering Target Material Market, this report introduces in detail the market share, market performance, product situation, operation situation, etc. of the main players, which helps the readers in the industry to identify the main competitors and deeply understand the competition pattern of the market.

In a word, this report is a must-read for industry players, investors, researchers, consultants, business strategists, and all those who have any kind of stake or are planning to foray into the Semiconductor Used High Purity Sputtering Target Material market in any manner.

Global Semiconductor Used High Purity Sputtering Target Material Market: Market Segmentation Analysis

The research report includes specific segments by region (country), manufacturers, Type, and Application. Market segmentation creates subsets of a market based on product type, end-user or application, Geographic, and other factors. By understanding the market segments, the decision-maker can leverage this targeting in the product, sales, and marketing strategies. Market segments can power your product development cycles by informing how you create product offerings for different segments.

Key Company

JX Nippon Mining & Metals Corporation

Materion

Konfoong Materials International Co., Ltd.

Linde

Plansee SE

Honeywell

TOSOH

TANAKA

ULVAC

Luvata

Hitachi Metals

Sumitomo Chemical

Longhua Technology Group (Luoyang) Co., Ltd.

GRIKIN Advanced Material Co., Ltd.

Umicore

Angstrom Sciences

Advantec

Changzhou Sujing Electronic Material

FURAYA Metals Co., Ltd

Market Segmentation (by Type)

Metal Sputtering Target Material

Alloy Sputtering Target Material

Non-metal Sputtering Target Material

Market Segmentation (by Application)

Consumer Electronics

Vehicle Electronics

Communication Electronics

Others

Geographic Segmentation
  • North America (USA, Canada, Mexico)
  • Europe (Germany, UK, France, Russia, Italy, Rest of Europe)
  • Asia-Pacific (China, Japan, South Korea, India, Southeast Asia, Rest of Asia-Pacific)
  • South America (Brazil, Argentina, Columbia, Rest of South America)
  • The Middle East and Africa (Saudi Arabia, UAE, Egypt, Nigeria, South Africa, Rest of MEA)
Key Benefits of This Market Research:
  • Industry drivers, restraints, and opportunities covered in the study
  • Neutral perspective on the market performance
  • Recent industry trends and developments
  • Competitive landscape & strategies of key players
  • Potential & niche segments and regions exhibiting promising growth covered
  • Historical, current, and projected market size, in terms of value
  • In-depth analysis of the Semiconductor Used High Purity Sputtering Target Material Market
  • Overview of the regional outlook of the Semiconductor Used High Purity Sputtering Target Material Market:
Key Reasons to Buy this Report:
  • Access to date statistics compiled by our researchers. These provide you with historical and forecast data, which is analyzed to tell you why your market is set to change
  • This enables you to anticipate market changes to remain ahead of your competitors
  • You will be able to copy data from the Excel spreadsheet straight into your marketing plans, business presentations, or other strategic documents
  • The concise analysis, clear graph, and table format will enable you to pinpoint the information you require quickly
  • Provision of market value (USD Billion) data for each segment and sub-segment
  • Indicates the region and segment that is expected to witness the fastest growth as well as to dominate the market
  • Analysis by geography highlighting the consumption of the product/service in the region as well as indicating the factors that are affecting the market within each region
  • Competitive landscape which incorporates the market ranking of the major players, along with new service/product launches, partnerships, business expansions, and acquisitions in the past five years of companies profiled
  • Extensive company profiles comprising of company overview, company insights, product benchmarking, and SWOT analysis for the major market players
  • The current as well as the future market outlook of the industry concerning recent developments which involve growth opportunities and drivers as well as challenges and restraints of both emerging as well as developed regions
  • Includes in-depth analysis of the market from various perspectives through Porter’s five forces analysis
  • Provides insight into the market through Value Chain
  • Market dynamics scenario, along with growth opportunities of the market in the years to come
  • 6-month post-sales analyst support
Customization of the Report

In case of any queries or customization requirements, please connect with our sales team, who will ensure that your requirements are met.

Note: this report may need to undergo a final check or review and this could take about 48 hours.

Chapter Outline

Chapter 1 mainly introduces the statistical scope of the report, market division standards, and market research methods.

Chapter 2 is an executive summary of different market segments (by region, product type, application, etc), including the market size of each market segment, future development potential, and so on. It offers a high-level view of the current state of the Semiconductor Used High Purity Sputtering Target Material Market and its likely evolution in the short to mid-term, and long term.

Chapter 3 makes a detailed analysis of the Market's Competitive Landscape of the market and provides the market share, capacity, output, price, latest development plan, merger, and acquisition information of the main manufacturers in the market.

Chapter 4 is the analysis of the whole market industrial chain, including the upstream and downstream of the industry, as well as Porter's five forces analysis.

Chapter 5 introduces the latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.

Chapter 6 provides the analysis of various market segments according to product types, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.

Chapter 7 provides the analysis of various market segments according to application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.

Chapter 8 provides a quantitative analysis of the market size and development potential of each region and its main countries and introduces the market development, future development prospects, market space, and capacity of each country in the world.

Chapter 9 introduces the basic situation of the main companies in the market in detail, including product sales revenue, sales volume, price, gross profit margin, market share, product introduction, recent development, etc.

Chapter 10 provides a quantitative analysis of the market size and development potential of each region in the next five years.

Chapter 11 provides a quantitative analysis of the market size and development potential of each market segment (product type and application) in the next five years.

Chapter 12 is the main points and conclusions of the report.


1 Research Methodology and Statistical Scope
1.1 Market Definition and Statistical Scope of Semiconductor Used High Purity Sputtering Target Material
1.2 Key Market Segments
1.2.1 Semiconductor Used High Purity Sputtering Target Material Segment by Type
1.2.2 Semiconductor Used High Purity Sputtering Target Material Segment by Application
1.3 Methodology & Sources of Information
1.3.1 Research Methodology
1.3.2 Research Process
1.3.3 Market Breakdown and Data Triangulation
1.3.4 Base Year
1.3.5 Report Assumptions & Caveats
2 Semiconductor Used High Purity Sputtering Target Material Market Overview
2.1 Global Market Overview
2.1.1 Global Semiconductor Used High Purity Sputtering Target Material Market Size (M USD) Estimates and Forecasts (2019-2030)
2.1.2 Global Semiconductor Used High Purity Sputtering Target Material Sales Estimates and Forecasts (2019-2030)
2.2 Market Segment Executive Summary
2.3 Global Market Size by Region
3 Semiconductor Used High Purity Sputtering Target Material Market Competitive Landscape
3.1 Global Semiconductor Used High Purity Sputtering Target Material Sales by Manufacturers (2019-2024)
3.2 Global Semiconductor Used High Purity Sputtering Target Material Revenue Market Share by Manufacturers (2019-2024)
3.3 Semiconductor Used High Purity Sputtering Target Material Market Share by Company Type (Tier 1, Tier 2, and Tier 3)
3.4 Global Semiconductor Used High Purity Sputtering Target Material Average Price by Manufacturers (2019-2024)
3.5 Manufacturers Semiconductor Used High Purity Sputtering Target Material Sales Sites, Area Served, Product Type
3.6 Semiconductor Used High Purity Sputtering Target Material Market Competitive Situation and Trends
3.6.1 Semiconductor Used High Purity Sputtering Target Material Market Concentration Rate
3.6.2 Global 5 and 10 Largest Semiconductor Used High Purity Sputtering Target Material Players Market Share by Revenue
3.6.3 Mergers & Acquisitions, Expansion
4 Semiconductor Used High Purity Sputtering Target Material Industry Chain Analysis
4.1 Semiconductor Used High Purity Sputtering Target Material Industry Chain Analysis
4.2 Market Overview of Key Raw Materials
4.3 Midstream Market Analysis
4.4 Downstream Customer Analysis
5 The Development and Dynamics of Semiconductor Used High Purity Sputtering Target Material Market
5.1 Key Development Trends
5.2 Driving Factors
5.3 Market Challenges
5.4 Market Restraints
5.5 Industry News
5.5.1 New Product Developments
5.5.2 Mergers & Acquisitions
5.5.3 Expansions
5.5.4 Collaboration/Supply Contracts
5.6 Industry Policies
6 Semiconductor Used High Purity Sputtering Target Material Market Segmentation by Type
6.1 Evaluation Matrix of Segment Market Development Potential (Type)
6.2 Global Semiconductor Used High Purity Sputtering Target Material Sales Market Share by Type (2019-2024)
6.3 Global Semiconductor Used High Purity Sputtering Target Material Market Size Market Share by Type (2019-2024)
6.4 Global Semiconductor Used High Purity Sputtering Target Material Price by Type (2019-2024)
7 Semiconductor Used High Purity Sputtering Target Material Market Segmentation by Application
7.1 Evaluation Matrix of Segment Market Development Potential (Application)
7.2 Global Semiconductor Used High Purity Sputtering Target Material Market Sales by Application (2019-2024)
7.3 Global Semiconductor Used High Purity Sputtering Target Material Market Size (M USD) by Application (2019-2024)
7.4 Global Semiconductor Used High Purity Sputtering Target Material Sales Growth Rate by Application (2019-2024)
8 Semiconductor Used High Purity Sputtering Target Material Market Segmentation by Region
8.1 Global Semiconductor Used High Purity Sputtering Target Material Sales by Region
8.1.1 Global Semiconductor Used High Purity Sputtering Target Material Sales by Region
8.1.2 Global Semiconductor Used High Purity Sputtering Target Material Sales Market Share by Region
8.2 North America
8.2.1 North America Semiconductor Used High Purity Sputtering Target Material Sales by Country
8.2.2 U.S.
8.2.3 Canada
8.2.4 Mexico
8.3 Europe
8.3.1 Europe Semiconductor Used High Purity Sputtering Target Material Sales by Country
8.3.2 Germany
8.3.3 France
8.3.4 U.K.
8.3.5 Italy
8.3.6 Russia
8.4 Asia Pacific
8.4.1 Asia Pacific Semiconductor Used High Purity Sputtering Target Material Sales by Region
8.4.2 China
8.4.3 Japan
8.4.4 South Korea
8.4.5 India
8.4.6 Southeast Asia
8.5 South America
8.5.1 South America Semiconductor Used High Purity Sputtering Target Material Sales by Country
8.5.2 Brazil
8.5.3 Argentina
8.5.4 Columbia
8.6 Middle East and Africa
8.6.1 Middle East and Africa Semiconductor Used High Purity Sputtering Target Material Sales by Region
8.6.2 Saudi Arabia
8.6.3 UAE
8.6.4 Egypt
8.6.5 Nigeria
8.6.6 South Africa
9 Key Companies Profile
9.1 JX Nippon Mining and Metals Corporation
9.1.1 JX Nippon Mining and Metals Corporation Semiconductor Used High Purity Sputtering Target Material Basic Information
9.1.2 JX Nippon Mining and Metals Corporation Semiconductor Used High Purity Sputtering Target Material Product Overview
9.1.3 JX Nippon Mining and Metals Corporation Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.1.4 JX Nippon Mining and Metals Corporation Business Overview
9.1.5 JX Nippon Mining and Metals Corporation Semiconductor Used High Purity Sputtering Target Material SWOT Analysis
9.1.6 JX Nippon Mining and Metals Corporation Recent Developments
9.2 Materion
9.2.1 Materion Semiconductor Used High Purity Sputtering Target Material Basic Information
9.2.2 Materion Semiconductor Used High Purity Sputtering Target Material Product Overview
9.2.3 Materion Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.2.4 Materion Business Overview
9.2.5 Materion Semiconductor Used High Purity Sputtering Target Material SWOT Analysis
9.2.6 Materion Recent Developments
9.3 Konfoong Materials International Co., Ltd.
9.3.1 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Basic Information
9.3.2 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Overview
9.3.3 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.3.4 Konfoong Materials International Co., Ltd. Semiconductor Used High Purity Sputtering Target Material SWOT Analysis
9.3.5 Konfoong Materials International Co., Ltd. Business Overview
9.3.6 Konfoong Materials International Co., Ltd. Recent Developments
9.4 Linde
9.4.1 Linde Semiconductor Used High Purity Sputtering Target Material Basic Information
9.4.2 Linde Semiconductor Used High Purity Sputtering Target Material Product Overview
9.4.3 Linde Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.4.4 Linde Business Overview
9.4.5 Linde Recent Developments
9.5 Plansee SE
9.5.1 Plansee SE Semiconductor Used High Purity Sputtering Target Material Basic Information
9.5.2 Plansee SE Semiconductor Used High Purity Sputtering Target Material Product Overview
9.5.3 Plansee SE Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.5.4 Plansee SE Business Overview
9.5.5 Plansee SE Recent Developments
9.6 Honeywell
9.6.1 Honeywell Semiconductor Used High Purity Sputtering Target Material Basic Information
9.6.2 Honeywell Semiconductor Used High Purity Sputtering Target Material Product Overview
9.6.3 Honeywell Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.6.4 Honeywell Business Overview
9.6.5 Honeywell Recent Developments
9.7 TOSOH
9.7.1 TOSOH Semiconductor Used High Purity Sputtering Target Material Basic Information
9.7.2 TOSOH Semiconductor Used High Purity Sputtering Target Material Product Overview
9.7.3 TOSOH Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.7.4 TOSOH Business Overview
9.7.5 TOSOH Recent Developments
9.8 TANAKA
9.8.1 TANAKA Semiconductor Used High Purity Sputtering Target Material Basic Information
9.8.2 TANAKA Semiconductor Used High Purity Sputtering Target Material Product Overview
9.8.3 TANAKA Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.8.4 TANAKA Business Overview
9.8.5 TANAKA Recent Developments
9.9 ULVAC
9.9.1 ULVAC Semiconductor Used High Purity Sputtering Target Material Basic Information
9.9.2 ULVAC Semiconductor Used High Purity Sputtering Target Material Product Overview
9.9.3 ULVAC Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.9.4 ULVAC Business Overview
9.9.5 ULVAC Recent Developments
9.10 Luvata
9.10.1 Luvata Semiconductor Used High Purity Sputtering Target Material Basic Information
9.10.2 Luvata Semiconductor Used High Purity Sputtering Target Material Product Overview
9.10.3 Luvata Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.10.4 Luvata Business Overview
9.10.5 Luvata Recent Developments
9.11 Hitachi Metals
9.11.1 Hitachi Metals Semiconductor Used High Purity Sputtering Target Material Basic Information
9.11.2 Hitachi Metals Semiconductor Used High Purity Sputtering Target Material Product Overview
9.11.3 Hitachi Metals Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.11.4 Hitachi Metals Business Overview
9.11.5 Hitachi Metals Recent Developments
9.12 Sumitomo Chemical
9.12.1 Sumitomo Chemical Semiconductor Used High Purity Sputtering Target Material Basic Information
9.12.2 Sumitomo Chemical Semiconductor Used High Purity Sputtering Target Material Product Overview
9.12.3 Sumitomo Chemical Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.12.4 Sumitomo Chemical Business Overview
9.12.5 Sumitomo Chemical Recent Developments
9.13 Longhua Technology Group (Luoyang) Co., Ltd.
9.13.1 Longhua Technology Group (Luoyang) Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Basic Information
9.13.2 Longhua Technology Group (Luoyang) Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Overview
9.13.3 Longhua Technology Group (Luoyang) Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.13.4 Longhua Technology Group (Luoyang) Co., Ltd. Business Overview
9.13.5 Longhua Technology Group (Luoyang) Co., Ltd. Recent Developments
9.14 GRIKIN Advanced Material Co., Ltd.
9.14.1 GRIKIN Advanced Material Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Basic Information
9.14.2 GRIKIN Advanced Material Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Overview
9.14.3 GRIKIN Advanced Material Co., Ltd. Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.14.4 GRIKIN Advanced Material Co., Ltd. Business Overview
9.14.5 GRIKIN Advanced Material Co., Ltd. Recent Developments
9.15 Umicore
9.15.1 Umicore Semiconductor Used High Purity Sputtering Target Material Basic Information
9.15.2 Umicore Semiconductor Used High Purity Sputtering Target Material Product Overview
9.15.3 Umicore Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.15.4 Umicore Business Overview
9.15.5 Umicore Recent Developments
9.16 Angstrom Sciences
9.16.1 Angstrom Sciences Semiconductor Used High Purity Sputtering Target Material Basic Information
9.16.2 Angstrom Sciences Semiconductor Used High Purity Sputtering Target Material Product Overview
9.16.3 Angstrom Sciences Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.16.4 Angstrom Sciences Business Overview
9.16.5 Angstrom Sciences Recent Developments
9.17 Advantec
9.17.1 Advantec Semiconductor Used High Purity Sputtering Target Material Basic Information
9.17.2 Advantec Semiconductor Used High Purity Sputtering Target Material Product Overview
9.17.3 Advantec Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.17.4 Advantec Business Overview
9.17.5 Advantec Recent Developments
9.18 Changzhou Sujing Electronic Material
9.18.1 Changzhou Sujing Electronic Material Semiconductor Used High Purity Sputtering Target Material Basic Information
9.18.2 Changzhou Sujing Electronic Material Semiconductor Used High Purity Sputtering Target Material Product Overview
9.18.3 Changzhou Sujing Electronic Material Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.18.4 Changzhou Sujing Electronic Material Business Overview
9.18.5 Changzhou Sujing Electronic Material Recent Developments
9.19 FURAYA Metals Co., Ltd
9.19.1 FURAYA Metals Co., Ltd Semiconductor Used High Purity Sputtering Target Material Basic Information
9.19.2 FURAYA Metals Co., Ltd Semiconductor Used High Purity Sputtering Target Material Product Overview
9.19.3 FURAYA Metals Co., Ltd Semiconductor Used High Purity Sputtering Target Material Product Market Performance
9.19.4 FURAYA Metals Co., Ltd Business Overview
9.19.5 FURAYA Metals Co., Ltd Recent Developments
10 Semiconductor Used High Purity Sputtering Target Material Market Forecast by Region
10.1 Global Semiconductor Used High Purity Sputtering Target Material Market Size Forecast
10.2 Global Semiconductor Used High Purity Sputtering Target Material Market Forecast by Region
10.2.1 North America Market Size Forecast by Country
10.2.2 Europe Semiconductor Used High Purity Sputtering Target Material Market Size Forecast by Country
10.2.3 Asia Pacific Semiconductor Used High Purity Sputtering Target Material Market Size Forecast by Region
10.2.4 South America Semiconductor Used High Purity Sputtering Target Material Market Size Forecast by Country
10.2.5 Middle East and Africa Forecasted Consumption of Semiconductor Used High Purity Sputtering Target Material by Country
11 Forecast Market by Type and by Application (2025-2030)
11.1 Global Semiconductor Used High Purity Sputtering Target Material Market Forecast by Type (2025-2030)
11.1.1 Global Forecasted Sales of Semiconductor Used High Purity Sputtering Target Material by Type (2025-2030)
11.1.2 Global Semiconductor Used High Purity Sputtering Target Material Market Size Forecast by Type (2025-2030)
11.1.3 Global Forecasted Price of Semiconductor Used High Purity Sputtering Target Material by Type (2025-2030)
11.2 Global Semiconductor Used High Purity Sputtering Target Material Market Forecast by Application (2025-2030)
11.2.1 Global Semiconductor Used High Purity Sputtering Target Material Sales (K Units) Forecast by Application
11.2.2 Global Semiconductor Used High Purity Sputtering Target Material Market Size (M USD) Forecast by Application (2025-2030)
12 Conclusion and Key Findings

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