Global Extreme Ultraviolet (UV) Lithography Market Size study & Forecast, by Product Type (Light Sources, Mirrors, Masks), by Type (Foundry, Integrated Device Manufacturers (IDMs)), and Regional Analysis, 2023-2030

Global Extreme Ultraviolet (UV) Lithography Market Size study & Forecast, by Product Type (Light Sources, Mirrors, Masks), by Type (Foundry, Integrated Device Manufacturers (IDMs)), and Regional Analysis, 2023-2030

Global Extreme Ultraviolet (UV) Lithography Market is valued approximately USD 10.3 billion in 2022 and is anticipated to grow with a healthy growth rate of more than 11.93% over the forecast period 2023-2030. Extreme ultraviolet (EUV) lithography is an advanced semiconductor manufacturing technique that utilizes short-wavelength light in the extreme ultraviolet range to create precise and intricate patterns on silicon wafers. It replaces traditional optical lithography methods and enables the fabrication of smaller, faster, and more power-efficient semiconductor devices by achieving higher resolution and pattern accuracy. EUV lithography plays a crucial role in the production of cutting-edge integrated circuits, enabling the semiconductor industry to meet the demands of shrinking device dimensions and complex circuit designs. The driving factors boosting the market growth are increasing demand for advanced semiconductor devices and growing complexity of integrated circuits.

According to Statista, the global semiconductor sales in 2022 amounted to USD 580.13 billion, showcasing the industry's significance as a vital component in electronic devices. With intense competition, the semiconductor industry experienced a year-on-year growth rate of 4.4 percent in 2022. Another driving factor is growing complexity of integrated circuits. With the increasing complexity of integrated circuits, traditional lithography techniques face limitations in achieving the required pattern accuracy and resolution. EUV lithography offers a viable solution to address the challenges associated with printing intricate and densely packed circuit patterns. Moreover, the evolution of IoT, AI and 5G technologies and advancements in EUV lithography technology is expected to create abundant opportunities in the market. However, the high cost of Extreme Ultraviolet (UV) Lithography systems and limited availability of EUV-compatible materials stifles market growth throughout the forecast period of 2023-2030.

The key regions considered for the Global Extreme Ultraviolet (UV) Lithography Market study includes Asia Pacific, North America, Europe, Latin America, and Middle East & Africa. North America dominated the market in 2022 owing to the established semiconductor industry, robust R&D ecosystem, and technological leadership in developing EUV lithography systems and related technologies. However, Asia Pacific is expected to become the fastest growing region during the forecast period, owing to factors such as strong economic growth and market potential, government support and policies to promote the semiconductor industry’s growth and favorable manufacturing environment with established semiconductor fabrication facilities and a skilled workforce.

Major market player included in this report are:
Canon Inc.
Nikon Corporation
ASML Holding N.V.
Intel Corporation
Samsung Electronics Co., Ltd.
Taiwan Semiconductor Manufacturing Company Limited (TSMC)
Toppan Photomasks Inc.
SK Hynix Inc.
Applied Materials Inc.
Lam Research Corporation

Recent Developments in the Market:
In October 2021, Samsung Electronics announced the launch of mass production of 14-nanometer (nm) dynamic random-access memory (DRAM) using extreme ultraviolet (EUV) lithography.

Global Extreme Ultraviolet (UV) Lithography Market Report Scope:
Historical Data – 2020 - 2021
Base Year for Estimation – 2022
Forecast period - 2023-2030
Report Coverage - Revenue forecast, Company Ranking, Competitive Landscape, Growth factors, and Trends
Segments Covered – Product Type, Type, Region
Regional Scope - North America; Europe; Asia Pacific; Latin America; Middle East & Africa

The objective of the study is to define market sizes of different segments & countries in recent years and to forecast the values to the coming years. The report is designed to incorporate both qualitative and quantitative aspects of the industry within countries involved in the study.

The report also caters detailed information about the crucial aspects such as driving factors & challenges which will define the future growth of the market. Additionally, it also incorporates potential opportunities in micro markets for stakeholders to invest along with the detailed analysis of competitive landscape and product offerings of key players.

The detailed segments and sub-segment of the market are explained below:

By Product Type:
Light Sources
Mirrors
Masks

By Type:
Foundry
Integrated Device Manufacturers (IDMs)

By Region:

North America
U.S.
Canada

Europe
UK
Germany
France
Spain
Italy
ROE

Asia Pacific
China
India
Japan
Australia
South Korea
RoAPAC

Latin America
Brazil
Mexico

Middle East & Africa
Saudi Arabia
South Africa
Rest of Middle East & Africa

Companies Mentioned
Canon Inc.
Nikon Corporation
ASML Holding N.V.
Intel Corporation
Samsung Electronics Co., Ltd.
Taiwan Semiconductor Manufacturing Company Limited (TSMC)
Toppan Photomasks Inc.
SK Hynix Inc.
Applied Materials Inc.
Lam Research Corporation

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