Extreme Ultraviolet Lithography (EUVL) Systems Market By Equipment (Light Source, Mirrors, Mask, Others), By Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, Gas Discharges): Global Opportunity Analysis and Industry Forecast, 2021-2031
The extreme ultraviolet lithography systems market was valued at $8.04 billion in 2021, and is projected to reach $77.07 billion by 2031, registering a CAGR of 25.1% from 2022 to 2031. Extreme ultraviolet lithography is an optical lithography process that produces a design by exposing a reflective photomask to UV light and having it reflect onto a photoresist-covered substrate.
The growth of the EUVL system market is majorly driven by the technological superiority over other lithography techniques coupled with the rise in sale of microelectronics devices. Furthermore, the imminent requirement for size contraction in electronic devices is anticipated to drive market growth. However, complexities in developing proper photoresists and challenges in making the perfect mask are acting as a prime restraint of the market. On the contrary, the rise in trends of the Internet of Things is anticipated to provide lucrative opportunities for the expansion of the EUVL system market during the forecast period.
The extreme ultraviolet lithography systems market is segmented by equipment, light source, and region. On the basis of equipment, the market is divided into light sources, mirrors, helmets, and others. On the basis of the light sources, the market is bifurcated into laser produce plasmas (LPP), vacuum sparks, and gas discharges. Region-wise, the EUVL system market trends are analyzed across North America (the U.S., Canada, and Mexico), Europe (the UK, Germany, France, and the rest of Europe), Asia-Pacific (China, India, Japan, and the rest of the Asia-Pacific), and LAMEA (Latin America, the Middle East, and Africa).
The key players operating in the market include ASML, Canon, and Nikon.
Key Benefits For Stakeholders
This report provides a quantitative analysis of the market segments, current trends, estimations, and dynamics of the extreme ultraviolet lithography (euvl) systems market analysis from 2021 to 2031 to identify the prevailing extreme ultraviolet lithography (euvl) systems market opportunities.
The market research is offered along with information related to key drivers, restraints, and opportunities.
Porter's five forces analysis highlights the potency of buyers and suppliers to enable stakeholders to make profit-oriented business decisions and strengthen their supplier-buyer network.
In-depth analysis of the extreme ultraviolet lithography (euvl) systems market segmentation assists to determine the prevailing market opportunities.
Major countries in each region are mapped according to their revenue contribution to the global market.
Market player positioning facilitates benchmarking and provides a clear understanding of the present position of the market players.
The report includes the analysis of the regional as well as global extreme ultraviolet lithography (euvl) systems market trends, key players, market segments, application areas, and market growth strategies.
Key Market Segments
By Light Source
Laser Produced Plasmas (LPP)
Vacuum Sparks
Gas Discharges
By Equipment
Mask
Others
Light Source
Mirrors
By Region
North America
U.S.
Canada
Mexico
Europe
United Kingdom
Germany
France
Rest of Europe
Asia-Pacific
China
Japan
India
Rest Of Asia Pacific
LAMEA
Latin America
Middle East
Africa
Key Market Players
ASML
CANNON INC.
NIKON CORPORATION
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